TOP > 外国特許検索 > METHOD FOR PRODUCING LITHIUM ADSORBENT, LITHIUM ADSORBENT, STARTING MATERIALS FOR LITHIUM ADSORBENT, LITHIUM CONCENTRATION METHOD, AND LITHIUM CONCENTRATION DEVICE

METHOD FOR PRODUCING LITHIUM ADSORBENT, LITHIUM ADSORBENT, STARTING MATERIALS FOR LITHIUM ADSORBENT, LITHIUM CONCENTRATION METHOD, AND LITHIUM CONCENTRATION DEVICE

外国特許コード F120006661
整理番号 S2010-0094
掲載日 2012年5月22日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP067986
国際公開番号 WO 2011/058841
国際出願日 平成22年10月13日(2010.10.13)
国際公開日 平成23年5月19日(2011.5.19)
優先権データ
  • 特願2009-257552 (2009.11.10) JP
発明の名称 (英語) METHOD FOR PRODUCING LITHIUM ADSORBENT, LITHIUM ADSORBENT, STARTING MATERIALS FOR LITHIUM ADSORBENT, LITHIUM CONCENTRATION METHOD, AND LITHIUM CONCENTRATION DEVICE
発明の概要(英語) Provided is a method for producing a lithium adsorbent, which is used in the industrial concentration and recovery of trace amounts of lithium contained in lithium-containing water, and which has excellent selective absorbency and high adsorption speed, has a high weight/adsorption ratio, and is capable of repeated adsorption and elution. The method comprises: a mechanochemical step for mixing trimanganese tetraoxide and lithium hydroxide such that the molar ratio of manganese (x) and lithium (y) is x:y = 1:1 to 1.5:1, and subjecting the mixture to mechanochemical pulverization; a pre-calcining step for then pre-calcining in a temperature range of 375oC to 450oC in air or an oxygen atmosphere; a calcining step for then cooling, mixing, and pulverizing, followed by calcining in a temperature range of 475oC to 550oC in air or an oxygen atmosphere in order to obtain a spinel-type lithium manganate with excess oxygen; and an elution step for eluting lithium by treating the spinel-type lithium manganate with excess oxygen using an acid in an amount that is in large excess with respect to the amount of lithium.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • KITAKYUSHU FOUNDATION FOR THE ADVANCEMENT OF INDUSTRY, SCIENCE AND TECHNOLOGY
  • 発明者(英語)
  • YOSHIZUKA Kazuharu
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
※ 特許の詳しい内容のお問い合わせ、又は実施許諾等のご相談については、下記「問合せ先」まで直接お問い合わせください。

PAGE TOP

close
close
close
close
close
close