TOP > 外国特許検索 > WATER THAT EXPRESSES PATHOGEN-RESISTANCE GENES (PR GENE CLUSTERS) TO ENCODE PLANT IMMUNOPROTEINS, A METHOD OF PREVENTING PLANT DISEASES USING THE WATER, AND A DEVICE FOR PRODUCING THE WATER

WATER THAT EXPRESSES PATHOGEN-RESISTANCE GENES (PR GENE CLUSTERS) TO ENCODE PLANT IMMUNOPROTEINS, A METHOD OF PREVENTING PLANT DISEASES USING THE WATER, AND A DEVICE FOR PRODUCING THE WATER

外国特許コード F120006664
整理番号 S2008-0942-C0
掲載日 2012年5月22日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2009JP066198
国際公開番号 WO 2010/032765
国際出願日 平成21年9月16日(2009.9.16)
国際公開日 平成22年3月25日(2010.3.25)
優先権データ
  • 特願2008-235861 (2008.9.16) JP
発明の名称 (英語) WATER THAT EXPRESSES PATHOGEN-RESISTANCE GENES (PR GENE CLUSTERS) TO ENCODE PLANT IMMUNOPROTEINS, A METHOD OF PREVENTING PLANT DISEASES USING THE WATER, AND A DEVICE FOR PRODUCING THE WATER
発明の概要(英語) Disclosed is a method of preventing plant diseases that is able to bring about a redox response inside plant cells to induce the expression of pathogen-resistance genes, whereby disease-resistant plants can be raised without the risk of leaving residual ingredients in the soil. By bringing water that contains reactive oxygen species and allows them to be stored and to function for long periods into contact with plants, and by inducing the pathogen-resistance genes possessed by the aforementioned plants, the water containing reactive oxygen is absorbed into the plants to prevent diseases in the aforementioned plants.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • KITAKYUSHU FOUNDATION FOR THE ADVANCEMENT OF INDUSTRY, SCIENCE AND TECHNOLOGY
  • 発明者(英語)
  • TANAKA Kenichiro
  • TANAKA Licca
  • KAWANO Tomonori
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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