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High order silane composition and method of manufacturing a film-coated substrate

外国特許コード F120006717
整理番号 E08603WO
掲載日 2012年5月28日
出願国 アメリカ合衆国
出願番号 201013143854
公報番号 20110318939
公報番号 8673682
出願日 平成22年1月7日(2010.1.7)
公報発行日 平成23年12月29日(2011.12.29)
公報発行日 平成26年3月18日(2014.3.18)
国際出願番号 JP2010050362
国際公開番号 WO2010079842
国際出願日 平成22年1月7日(2010.1.7)
国際公開日 平成22年7月15日(2010.7.15)
優先権データ
  • 特願2009-003554 (2009.1.9) JP
  • 2010JP050362 (2010.1.7) WO
発明の名称 (英語) High order silane composition and method of manufacturing a film-coated substrate
発明の概要(英語) A composition containing a high order silane compound and a solvent, wherein the solvent contains a cyclic hydrocarbon which has one or two double bonds and no alkyl group, is composed of only carbon and hydrogen and has a refractive index of 1.40 to 1.51, a specific permittivity of not more than 3.0 and a molecular weight of not more than 180.
Method of manufacturing a film-coated substrate using the high order silane composition.
特許請求の範囲(英語) [claim1]
1. A composition comprising a high order silane compound and a solvent, wherein the high order silane compound is obtained by irradiating at least one silane compound selected from the group consisting of compounds represented by the following formulas (2) and (3) with ultraviolet light
SiiX2i (2)

SijX2j-2 (3)
where X is a hydrogen atom or a halogen atom, i is an integer of 3 to 8, and j is an integer of 4 to 14, and the solvent comprises a cyclic hydrocarbon which: has one or two double bonds and no alkyl group,
consists of carbon and hydrogen,
has a refractive index of 1.40 to 1.51,
has a specific permittivity of not more than 3.0, and
has a molecular weight of not more than 180.
[claim2]
2. The high order silane composition according to claim 1, wherein the content of the high order silane compound in the high order silane composition is 1 to 50 wt %.
[claim3]
3. The high order silane composition according to claim 1, wherein the solvent consists of the cyclic hydrocarbon.
[claim4]
4. The high order silane composition according to claim 1, wherein the solvent comprises the cyclic hydrocarbon and a compound having a silicon atom in the molecule.
[claim5]
5. A method of manufacturing a film-coated substrate, comprising supplying the high order silane composition of claim 1 onto a substrate and removing the solvent from the high order silane composition to form a film of a high order silane compound on said substrate.
[claim6]
6. The method of manufacturing a film-coated substrate according to claim 5, which further comprises subjecting the film of the high order silane compound on said substrate to at least one treatment selected from the group consisting of a heat treatment and a light treatment in a nonoxidizing atmosphere to convert the high order silane compound into silicon so as to form a silicon film on said substrate.
[claim7]
7. The method of manufacturing a film-coated substrate according to claim 5, which further comprises subjecting the film of the high order silane compound on said substrate to a heat treatment in a nonoxidizing atmosphere to convert the high order silane compound into silicon and subjecting the silicon to a heat treatment in an oxidizing atmosphere to convert the silicon into silicon oxide so as to form a silicon oxide film on said substrate.
[claim8]
8. The method of manufacturing a film-coated substrate according to claim 5, which further comprises subjecting the film of the high order silane compound on said substrate to at least one treatment selected from the group consisting of a heat treatment and a light treatment in an oxidizing atmosphere to convert the high order silane compound into silicon oxide so as to form a silicon oxide film on said substrate.
[claim9]
9. The high order silane composition according to claim 1, wherein the high order silane compound is obtained by irradiating a silane compound represented by formula (2) with ultraviolet light.
[claim10]
10. The high order silane composition according to claim 9, wherein the silane compound represented by formula (2) is selected from the group consisting of cyclotrisilane, cyclotetrasilane, cyclopentasilane, cyclohexasilane, cycloheptasilane and mixtures thereof.
[claim11]
11. The high order silane composition according to claim 1, wherein the high order silane compound is obtained by irradiating a silane compound represented by formula (3) with ultraviolet light.
[claim12]
12. The high order silane composition according to claim 11, wherein the silane compound represented by formula (3) is selected from the group consisting of 1,1'-bicyclobutasilane, 1,1'-bicyclopentasilane, 1,1'-bicyclohexasilane, 1,1'-bicycloheptasilane, 1,1'-cyclobutasilylcyclopentasilane, 1,1'-cyclobutasilylcyclohexasilane, 1,1'-cyclobutasilylcycloheptasilane, 1,1'-cyclopentasilylcyclohexasilane, 1,1'-cyclopentasilylcycloheptasilane, 1,1'-cyclohexasilylcycloheptasilane, spiro[2.2]pentasilane, spiro[3.3]heptasilane, spiro[4.4]nonasilane, spiro[4.5]decasilane, spiro[4.6]undecasilane, spiro[5.5]undecasilane, spiro[5.6]dodecasilane, spiro[6.6]tridecasilane and mixtures thereof.
[claim13]
13. The high order silane composition according to claim 1, wherein the cyclic hydrocarbon has a refractive index of 1.42 to 1.49 and a specific permittivity of not more than 3.0.
[claim14]
14. The high order silane composition according to claim 13, wherein the cyclic hydrocarbon has a molecular weight of 60 to 160 and a specific permittivity of not more than 2.3.
[claim15]
15. The high order silane composition according to claim 13, wherein the cyclic hydrocarbon is a cyclic hydrocarbon which has one double bond, a specific permittivity of not more than 2.3 and a molecular weight of 65 to 120.
[claim16]
16. The high order silane composition according to claim 1, wherein the cyclic hydrocarbon is selected from the group consisting of 1,2,3,4,4a,5,6,8a-octahydronaphthalene, 1,2,3,4,5,6,7,8-octahydronaphthalene, 1,2,3,4,5,8-hexahydronaphthalene, 1,2,3,4,5,6-hexahydronaphthalene, 1,2,4a,5,8,8a-hexahydronaphthalene, 2,3,3a,4,5,7a-hexahydro-1H-indene, 2,3,3a,4,7,7a-hexahydro-1H-indene, 2,3,3a,4,5,6-hexahydro-1H-indene, 2,3,4,5,6,7-hexahydro-1H-indene, 2,4,7,7a-tetrahydro-1H-indene, 2,3,4,7-tetrahydro-1H-indene, 2,3,4,5-tetrahydro-1H-indene, 4,5,6,7-tetrahydro-1H-indene, 4,5,6,7-tetrahydro-2H-indene, 1,2,3,3a,4,6a-hexahydropentalene, 1,2,3,3a,4,5-hexahydropentalene, 1,2,3,4,5,6-hexahydropentalene, 1,2,3,4-tetrahydropentalene, 1,2,6,6a-tetrahydropentalene, 1,3a,6,6a-tetrahydropentalene, cyclopropene, cyclobutene, cyclobuta-1,2-diene, cyclobuta-1,3-diene, cyclopentene, cyclopenta-1,2-diene, cyclopenta-1,3-diene, cyclohexene, cyclohexa-1,2-diene, cyclohexa-1,3-diene, cyclohexa-1,4-diene, cycloheptene, cyclohepta-1,2-diene, cyclohepta-1,3-diene, cyclohepta-1,4-diene, cyclooctene, cycloocta-1,2-diene, cycloocta-1,3-diene, cycloocta-1,4-diene, cycloocta-1,5-diene, cyclononene, cyclonona-1,2-diene, cyclonona-1,3-diene, cyclonona-1,4-diene, cyclonona-1,5-diene, cyclodecene, cyclodeca-1,2-deine, cyclodeca-1,3-diene, cyclodeca-1,4-diene, cyclodeca-1,5-diene, cyclodeca-1,6-diene, bicyclo[2.2.1]hepta-2-ene, bicyclo[2.2.1]hepta-1-ene, bicyclo[2.2.1]hepta-1,3-diene, bicyclo [2.2.1]hepta-2,5-diene, bicyclo[2.2.2]octa-2-ene, bicyclo[2.2.2]octa-2,5-diene, bicyclo[2.2.2]octa-1,2-diene, bicyclo[2.2.2]octa-1,5-diene, bicyclo[2.2.2]octa-1,4-diene, 1,1'-bi(cyclohexa-3-ene), 1-cyclohexylcyclohexa-1,4-diene, 5-cyclohexylcyclohexa-1,3-diene, (1R,6S)-bicyclo[4.2.0]octa-3-ene, (1R,6S)-bicyclo[4.2.0]octa-3,7-diene and mixtures thereof.
[claim17]
17. The high order silane composition according to claim 16, wherein the high order silane compound is obtained by irradiating a silane compound represented by formula (2) with ultraviolet light, and wherein the silane compound represented by formula (2) is selected from the group consisting of cyclotetrasilane, cyclopentasilane, cyclohexasilane, cycloheptasilane and mixtures thereof.
  • 発明者/出願人(英語)
  • SHIMODA TATSUYA
  • MATSUKI YASUO
  • MASUDA TAKASHI
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
国際特許分類(IPC)
米国特許分類/主・副
  • 438/99
  • 106/287.1
  • 438/787
参考情報 (研究プロジェクト等) ERATO SHIMODA Nano-Liquid Process AREA
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