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THIN-FILM FORMATION METHOD, THIN-FILM FORMATION DEVICE, OBJECT TO BE TREATED HAVING COATING FILM FORMED THEREON, DIE AND TOOL

外国特許コード F130007294
整理番号 S2011-0869-N0
掲載日 2013年4月11日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2012JP005957
国際公開番号 WO 2013/042355
国際出願日 平成24年9月20日(2012.9.20)
国際公開日 平成25年3月28日(2013.3.28)
優先権データ
  • 特願2011-208140 (2011.9.22) JP
発明の名称 (英語) THIN-FILM FORMATION METHOD, THIN-FILM FORMATION DEVICE, OBJECT TO BE TREATED HAVING COATING FILM FORMED THEREON, DIE AND TOOL
発明の概要(英語)

[Problem] To provide a means for forming a thin-film in a desired part of an object to be treated. [Solution] The thin-film formation means according to the present invention is part of a thin-film formation method which supplies electricity to a raw-material gas in a reduced pressure container, converting the raw-material gas to plasma, and irradiates the plasma, thus forming a thin-film on the surface of an object to be treated. Therein, the effect of a magnetic field generated by a magnetic field generating means is used to form the thin-film in a desired part. The effect of the magnetic field focuses the flux of the plasma in a desired part of the surface of the object to be treated, thus enabling the thin-film to be formed in the desired part.

  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • SHIBAURA INSTITUTE OF TECHNOLOGY,
  • AIZAWA, TATSUHIKO,
  • MORITA, HIROSHI,
  • KUROSUMI, SHUICHI
  • 発明者(英語)
  • AIZAWA, TATSUHIKO,
  • MORITA, HIROSHI,
  • KUROSUMI, SHUICHI
国際特許分類(IPC)

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