TOP > 外国特許検索 > PHYSICAL/CHEMICAL SENSOR, PHYSICAL/CHEMICAL PHENOMENON SENSING DEVICE, AND METHOD FOR MANUFACTURING SAME

PHYSICAL/CHEMICAL SENSOR, PHYSICAL/CHEMICAL PHENOMENON SENSING DEVICE, AND METHOD FOR MANUFACTURING SAME

外国特許コード F130007299
整理番号 S2011-1168-N0
掲載日 2013年4月17日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2012JP075182
国際公開番号 WO 2013/047799
国際出願日 平成24年9月28日(2012.9.28)
国際公開日 平成25年4月4日(2013.4.4)
優先権データ
  • 特願2011-218582 (2011.9.30) JP
  • 特願2012-114589 (2012.5.18) JP
  • 特願2012-172374 (2012.8.2) JP
発明の名称 (英語) PHYSICAL/CHEMICAL SENSOR, PHYSICAL/CHEMICAL PHENOMENON SENSING DEVICE, AND METHOD FOR MANUFACTURING SAME
発明の概要(英語)

The present invention relates to a physical/chemical sensor, a physical/chemical phenomenon sensing device, and a method for manufacturing the same with which a minute change in surface stress may be detected, and size reduction and array configuration may be enabled. In the sensor of the present invention, a hollow portion (3) is formed at a surface of a light receiving surface (1a) of a photo diode (1). The sensor comprises a membrane portion (2) which is oppositely disposed, and the hollow portion is isolated airtightly and watertightly. The membrane portion has light permeability and flexibility, and forms a Fabry-Perot resonator with the surface of the light receiving surface. The sensing device of the present invention comprises a reference sensor, which comprises no hollow portion, in addition to the sensor. The manufacturing method of the present invention comprises forming a sacrificial layer at the light receiving surface of the photo diode, laminating an area other than a surface of the sacrificial surface with a protective film, forming the membrane portion at a membrane portion configuration area other than an etching target area, etching the sacrificial layer, and coating the etching target area.

  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • NATIONAL UNIVERSITY CORPORATION TOYOHASHI UNIVERSITY OF TECHNOLOGY
  • 発明者(英語)
  • TAKAHASHI KAZUHIRO,
  • SAWADA KAZUAKI,
  • OYAMA HIROKI
国際特許分類(IPC)
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