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Plasma generator

外国特許コード F130007395
整理番号 Y0364EP2
掲載日 2013年6月11日
出願国 欧州特許庁(EPO)
出願番号 12195030
公報番号 2565903
公報番号 2565903
出願日 平成16年1月15日(2004.1.15)
公報発行日 平成25年3月6日(2013.3.6)
公報発行日 平成26年9月10日(2014.9.10)
優先権データ
  • 04702413 (2004.1.15) EP
  • 特願2003-008648 (2003.1.16) JP
発明の名称 (英語) Plasma generator
発明の概要(英語) A plasma generation device of the present invention, comprising: a vacuum chamber (6) for generating a plasma; at least one antenna conductor (1a) provided in the vacuum chamber (6) so as to generate an inductive electric field when high frequency power is applied; and a first insulator (12a) disposed around a portion of the antenna conductor (1a) which portion exists in the vacuum chamber (6), wherein the plasma and the antenna conductor (1a) are prevented from being in contact with each other by a first space region (18a) intervening between the first insulator (12a) and the portion; and a second insulator (12b) is disposed around the first insulator (12a) so that a second space region (18b) intervenes between the first insulator (12a) and the second insulator (12b). (see diagramm)
特許請求の範囲(英語) [claim1]
1. A plasma generation device, comprising: a vacuum chamber (6) for generating a plasma; at least one antenna conductor (1a) provided in the vacuum chamber (6) so as to generate an inductive electric field when high frequency power is applied; a first insulator (12a) disposed around a portion of the antenna conductor (1a) which portion exists in the vacuum chamber (6), wherein the plasma and the antenna conductor (1a) are prevented from being in contact with each other by a first space region (18a) intervening between the first insulator (12a) and the portion; characterized in that the plasma generation device comprises a second insulator (12b) disposed around the first insulator (12a) so that a second space region (18b) intervenes between the first insulator (12a) and the second insulator (12b).
[claim2]
2. The plasma generation device as set forth in claim 1, wherein: a grounding electrode surrounding the first insulator is provided on an antenna introduction section formed on the antenna conductor so as to be positioned in proximity to an internal wall of the vacuum chamber, and the second insulator is disposed around the grounding electrode so as to prevent the plasma and the grounding electrode from being in contact with each other.
[claim3]
3. The plasma generation device as set forth in claim 2, wherein the grounding electrode has a zigzag structure in which the grounding electrode alternately protrudes in a direction orthogonal to a conduction direction of the antenna conductor so that a long axis direction of the grounding electrode corresponds to the conduction direction of the antenna conductor.
[claim4]
4. The plasma generation device as set forth in claim 1, comprising a sensor provided in the vacuum chamber so as to measure an intensity of a high frequency inductive magnetic field irradiated from the antenna conductor.
[claim5]
5. The plasma generation device as set forth in claim 4, comprising a plurality of sensors provided in positions different from each other in terms of a distance from the antenna conductor.
[claim6]
6. The plasma generation device as set forth in claim 5, comprising a plasma control section for controlling a condition, under which the antenna conductor is driven, by calculating a plasma condition in the vacuum chamber on the basis of (i) a measurement result given by each of the sensors and (ii) a value of the high frequency current flowing in the antenna conductor.
[claim7]
7. The plasma generation device as set forth in claim 4, wherein the sensor includes: a magnetic field intensity detection section; and a first shield for covering the magnetic field intensity detection section.
[claim8]
8. The plasma generation device as set forth in claim 7, wherein
the sensor includes a second shield for suppressing formation of an adhering substance on the first shield and for preventing the magnetic field intensity detection section from being shielded from the high frequency inductive magnetic field.
[claim9]
9. The plasma generation device as set forth in claim 8, wherein
the second shield has a slit section for preventing the magnetic field intensity detection section from being shielded from the high frequency inductive magnetic field.
  • 出願人(英語)
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • 発明者(英語)
  • SETSUHARA YUICHI
  • SHOJI TATSUO
  • KAMAI MASAYOSHI
国際特許分類(IPC)
指定国 Contracting States: BE DE FR GB NL
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