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METHOD AND DEVICE FOR MANUFACTURING SEMICONDUCTOR OR INSULATOR/METALLIC LAMINAR COMPOSITE CLUSTER

外国特許コード F040000771
整理番号 F040000771
掲載日 2005年2月22日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2003JP000716
国際公開番号 WO 2003/072848
国際出願日 平成15年1月27日(2003.1.27)
国際公開日 平成15年9月4日(2003.9.4)
優先権データ
  • 特願2002-049310 (2002.2.26) JP
発明の名称 (英語) METHOD AND DEVICE FOR MANUFACTURING SEMICONDUCTOR OR INSULATOR/METALLIC LAMINAR COMPOSITE CLUSTER
発明の概要(英語) A method and a device for manufacturing a semiconductor or insulator/metallic laminar composite cluster, the method comprising the step of spattering fluid on targets (11U) and (11D) in a first cluster source chamber (10) to generate semiconductor or insulator vapor, spattering fluid on targets (21U) and (21D) in a second cluster source chamber (20) to generate metallic vapor, feeding, as cluster beam, the semiconductor or insulator vapor and metallic vapor coagulated and grown to the cluster when flowing through a cluster growing pipe (32) into a depositing chamber (30) maintained in a high vacuum atmosphere, and stacking, on a substrate (35), the cluster having metallic clusters and semiconductor or insulator clusters combined with each other in layer shape. The semiconductor (insulator)/metallic multilayer composite cluster thus manufactured is used, by utilizing a high functionality, as a high sensitive sensor, a high-density magnetic recording medium, a nano magnet medium for carrying chemicals, various types of catalysts, a permselective membrane, a photomagneto sensor, and a low loss soft magnetic substance.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • Japan Science And Technology Corporation
  • 発明者(英語)
  • Hihara, Takehiko
  • Sumiyama, Kenji
  • Katoh, Ryoji
国際特許分類(IPC)
指定国 CN KR US AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT SE SI SK TR
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