TOP > 外国特許検索 > SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, PRODUCTION METHOD THEREFOR, AND METHOD FOR SEARCHING FOR LOW-RESISTIVITY COPPER WIRING USED IN SAID SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, PRODUCTION METHOD THEREFOR, AND METHOD FOR SEARCHING FOR LOW-RESISTIVITY COPPER WIRING USED IN SAID SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

外国特許コード F150008409
整理番号 S2015-0138-N0
掲載日 2015年7月21日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2014JP059913
国際公開番号 WO 2014185187
国際出願日 平成26年3月28日(2014.3.28)
国際公開日 平成26年11月20日(2014.11.20)
優先権データ
  • 特願2013-101708 (2013.5.13) JP
発明の名称 (英語) SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, PRODUCTION METHOD THEREFOR, AND METHOD FOR SEARCHING FOR LOW-RESISTIVITY COPPER WIRING USED IN SAID SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
発明の概要(英語) Provided are: a semiconductor integrated circuit device capable of suppressing increase in resistivity associated with reduction in wiring width and of further lowering the resistivity of a wiring layer, in relation to the increasing integration, density, and speed of LSI; a production method therefor; and an efficient low-resistivity copper wiring search method. The present invention comprises: a semiconductor substrate having circuit elements formed thereon; an insulating layer formed upon the main surface thereof; a trench formed using at least one insulating layer; and copper wiring formed inside the trench. The width of the copper wiring is no more than 100 nm and the concentration of a compound present as an impurity in the crystal grain boundary of the copper wiring and comprising metal elements, chlorine, and oxygen is no more than 2.0 atom% when converted to chlorine concentration. The present invention is characterized by the metal elements in the compound identified as an impurity being copper or iron, and when the impurity is a compound comprising Fe, Cl, and O, the concentration thereof is no more than 1.1 atom% when converted to Fe concentration.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • IBARAKI UNIVERSITY
  • 発明者(英語)
  • ONUKI JIN
  • SASAJIMA YASUSHI
  • NAGANO TAKATOSHI
  • TAMAHASHI KUNIHIRO
  • CHIBA AKIO
国際特許分類(IPC)
指定国 National States: AE AG AL AM AO AT AU AZ BA BB BG BH BN BR BW BY BZ CA CH CL CN CO CR CU CZ DE DK DM DO DZ EC EE EG ES FI GB GD GE GH GM GT HN HR HU ID IL IN IR IS KE KG KN KP KR KZ LA LC LK LR LS LT LU LY MA MD ME MG MK MN MW MX MY MZ NA NG NI NO NZ OM PA PE PG PH PL PT QA RO RS RU RW SA SC SD SE SG SK SL SM ST SV SY TH TJ TM TN TR TT TZ UA UG US UZ VC VN ZA ZM ZW
ARIPO: BW GH GM KE LR LS MW MZ NA RW SD SL SZ TZ UG ZM ZW
EAPO: AM AZ BY KG KZ RU TJ TM
EPO: AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
OAPI: BF BJ CF CG CI CM GA GN GQ GW KM ML MR NE SN TD TG
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