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SECURITY MARK, AUTHENTICATIONG METHOD THEREFOR, AUTHENTICATION DEVICE AND MANUFACTURING METHOD AS WELL AS SECURITY MARK INK AND MANUFACTURING METHOD THEREFOR

外国特許コード F150008518
整理番号 AF20-03WO
掲載日 2015年11月19日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2015JP000371
国際公開番号 WO 2015133056
国際出願日 平成27年1月28日(2015.1.28)
国際公開日 平成27年9月11日(2015.9.11)
優先権データ
  • 特願2014-040378 (2014.3.3) JP
発明の名称 (英語) SECURITY MARK, AUTHENTICATIONG METHOD THEREFOR, AUTHENTICATION DEVICE AND MANUFACTURING METHOD AS WELL AS SECURITY MARK INK AND MANUFACTURING METHOD THEREFOR
発明の概要(英語) As a technique capable of achieving higher security performance in methods for authenticating security marks that use a photochromic compound, provided is an authentication method that comprises: a process for irradiating excitation light on a security mark containing a photochromic compound; a process for acquiring first security information relating to temporal changes of the absorption spectrum and/or the reflection spectrum of the security mark after irradiation of the excitation light; and a process for comparing the acquired first security information with previously acquired first security information on said security mark. In said authentication method, the security mark preferably contains two or more photochromic compounds for which the coloring and/or the rate of decoloring after coloring as a result of a photochromic reaction differ.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • 発明者(英語)
  • ABE JIRO
  • KOBAYASHI YOICHI
国際特許分類(IPC)
指定国 National States: AE AG AL AM AO AT AU AZ BA BB BG BH BN BR BW BY BZ CA CH CL CN CO CR CU CZ DE DK DM DO DZ EC EE EG ES FI GB GD GE GH GM GT HN HR HU ID IL IN IR IS JP KE KG KN KP KR KZ LA LC LK LR LS LU LY MA MD ME MG MK MN MW MX MY MZ NA NG NI NO NZ OM PA PE PG PH PL PT QA RO RS RU RW SA SC SD SE SG SK SL SM ST SV SY TH TJ TM TN TR TT TZ UA UG US UZ VC VN ZA ZM ZW
ARIPO: BW GH GM KE LR LS MW MZ NA RW SD SL SZ TZ UG ZM ZW
EAPO: AM AZ BY KG KZ RU TJ TM
EPO: AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
OAPI: BF BJ CF CG CI CM GA GN GQ GW KM ML MR NE SN TD TG
参考情報 (研究プロジェクト等) CREST Development of High-Performance Nanostructures for Process Integration AREA
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