TOP > 外国特許検索 > POLYMER BRUSH

POLYMER BRUSH NEW 新技術説明会

外国特許コード F170008957
整理番号 E097P09WO
掲載日 2017年3月9日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2015JP063241
国際公開番号 WO 2015170724
国際出願日 平成27年5月8日(2015.5.8)
国際公開日 平成27年11月12日(2015.11.12)
優先権データ
  • 特願2014-097007 (2014.5.8) JP
発明の名称 (英語) POLYMER BRUSH NEW 新技術説明会
発明の概要(英語) The purpose of the present invention is to provide a polymer brush that is able to form a phase-separated structure even in a gaseous phase. This polymer brush is characterized by a substrate, and by a polymer layer that has one end fixed to the substrate and in which the phase separation state between a polymer dense part and a polymer loose part changes reversibly.
特許請求の範囲(英語) [claim1]
1. Edge is locked by the backing material and the aforementioned backing material, possessing the polymer layer which is formed with the plural polymer chains where the other edge is the free edge,
In the aforementioned polymer layer, the polymer dense section and the polymer the polymer brush where roughly the section phase separated state with changes reversibly.
[claim2]
2. When putting in a state where the aforementioned polymer layer is not separated, phase, thickness, is above 1nm and below 50nm, in the claim 1 where the Kazuhei equal molecular weight of the aforementioned polymer chain 2,000 or more and is 1,000,000 or less the polymer brush of statement.
[claim3]
3. Front diagnosis isolation structure, in the claim 1 which structure is controlled reversibly by the change of external environment or 2 the polymer brush of statement.
[claim4]
4. Change of environment outside the description above, in the claim 3 which is something due to the change of temperature, pressure or ion concentration the polymer brush of statement.
[claim5]
5. Backing material and,
Edge is locked by the aforementioned backing material, possessing the polymer layer which is formed with the plural polymer chains where the other edge is the free edge,
At the aforementioned polymer layer, the polymer dense section and the polymer the phase amount mold release polymer brush where the section are formed roughly.
[claim6]
6. The aforementioned dense section of the aforementioned polymer layer in the claim 5 where the section, repeatedly appears roughly periodically in plane surface direction the polymer brush of statement.
[claim7]
7. The aforementioned dense section the phase isolation structure which the section forms roughly, sea island structure and cylinder structure, also in the claim 5 which is connected type structure or lamella structure or 6 the polymer brush of statement.
[claim8]
8. The polymer brush of statement is made to contact with the solvent in either of the claim 1-7,
By the fact that it changes external environment, the surface state control method of changing the phase separated state of the polymer brush.
[claim9]
9. Change of environment outside the description above, temperature of the solvent, in the claim 8 which is something due to the change of pressure or ion concentration surface state control method of statement.
[claim10]
10. The backing material and fixed end density IìL (place /nm (2)) with edge is locked by the aforementioned backing material, the polymer brush which possesses the plural polymer chains where the other edge becomes the free edge (A) and the solvent (B),
When mixing with the aforementioned solvent in the state of free without making the aforementioned polymer chain connect with the backing material, in the phase diagram it makes contact at the temperature where the solution of the polymer density which is decided with the below-mentioned formula (1) becomes phase separated state,
Next, it is inside the temperature range which becomes this phase separated state, production method of the phase amount mold release polymer brush which replaces the aforementioned solvent to the vapor phase at the temperature which at the same time is below glass transition temperature of the aforementioned polymer.
Polymer density (volume %) =.sigma. (place /nm (2)) Kazuhei equal molecular weight of A polymer chain (g/mol) x10 (21)/(distance between root mean square end of the polymer chain of free (nm) A Avogadro's number Na (mol (- 1))Density of A polymer chain (g/cm (3))) (1)
[claim11]
11. Fixed end density IìL of the aforementioned polymer chain, 0.001 (place /nm (2)) above, 0.1 (place /nm (2)) in the claim 10 which is below production method of the polymer brush of statement.
[claim12]
12. As for the aforementioned solvent (B), the polymer chain and of the state of free it has not connected to the backing material (1) when mixing at the polymer density which is decided with the aforementioned system, the claim in either 10 which is the solvent where bi- nodal start temperature is a range above the 1.deg.C and below the 100.deg.C or 11 production method of the polymer brush of statement.
[claim13]
13. The aforementioned polymer and solvent (B) combination,
(1) polymer: Aromatic hydrocarbon type polymer, solvent: Hydrocarbon type solvent, or
(2) polymer: (Meta) modacrylic polymer, solvent: Water system solvent
So in either of the claim 10-12 which is production method of the polymer brush of statement.
[claim14]
14. The polymer brush of statement, is heated above glass transition temperature of the polymer in either of the claim 1-7, manufacturing method of phase isolation structure.
[claim15]
15. The surface improvement component where the polymer brush of statement is formed to the surface in either of the claim 1-7.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • 発明者(英語)
  • TAKAHARA ATSUSHI
  • JINNAI HIROSHI
  • MURAKAMI DAIKI
  • NORIZOE YUKI
国際特許分類(IPC)
指定国 (WO2015170724)
National States: AE AG AL AM AO AT AU AZ BA BB BG BH BN BR BW BY BZ CA CH CL CN CO CR CU CZ DE DK DM DO DZ EC EE EG ES FI GB GD GE GH GM GT HN HR HU ID IL IN IR IS JP KE KG KN KP KR KZ LA LC LK LR LS LU LY MA MD ME MG MK MN MW MX MY MZ NA NG NI NO NZ OM PA PE PG PH PL PT QA RO RS RU RW SA SC SD SE SG SK SL SM ST SV SY TH TJ TM TN TR TT TZ UA UG US UZ VC VN ZA ZM ZW
ARIPO: BW GH GM KE LR LS MW MZ NA RW SD SL SZ TZ UG ZM ZW
EAPO: AM AZ BY KG KZ RU TJ TM
EPO: AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
OAPI: BF BJ CF CG CI CM GA GN GQ GW KM ML MR NE SN ST TD TG
参考情報 (研究プロジェクト等) ERATO TAKAHARA Soft Interface AREA
ライセンスをご希望の方、特許の内容に興味を持たれた方は、問合せボタンを押してください。

PAGE TOP

close
close
close
close
close
close