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Composite material, method for producing same, and apparatus for producing same NEW

外国特許コード F170008996
整理番号 N072-17CN2
掲載日 2017年3月14日
出願国 中華人民共和国
出願番号 201510292146
公報番号 105506590
出願日 平成21年3月2日(2009.3.2)
公報発行日 平成28年4月20日(2016.4.20)
国際出願番号 JP2009053877
国際公開番号 WO2009110431
国際出願日 平成21年3月2日(2009.3.2)
国際公開日 平成21年9月11日(2009.9.11)
優先権データ
  • 特願2008-057865 (2008.3.7) JP
  • 特願2008-211238 (2008.8.19) JP
  • 2009CN-80107159 (2009.3.2) CN
発明の名称 (英語) Composite material, method for producing same, and apparatus for producing same NEW
発明の概要(英語) (CN105506590)
Provided are a composite material having a high adhesiveness, wherein non-penetrating pores that are formed in a silicone surface layer are filled up with a metal or the like without leaving any voids by using the plating technique and the silicone surface layer is coated with the metal or the like, and a method of producing the composite material.
A composite material, which has a high adhesiveness between a second metal or an alloy of the second metal (106a, 106b) and a silicone surface, can be obtained by filling up non-penetrating pores that are formed in the surface of a silicone substrate (100) substantially with a second metal or an alloy of the second metal (106a) with the use of the autocatalytic electroless plating technique wherein a first metal located at the bottom of the non-penetrating pores as described above serves as the starting point, and coating the surface of the silicone substrate (100) with the second metal (106b).
特許請求の範囲(英語) [claim1]
1. One composite material, wherein, from the silicon surface to be located in a non-through holes are formed through electroless step 1st metal as a starting point at the bottom of, by using a self-catalytic type non-penetrating pores substantial electro less plating metal or metal alloy of 2nd 2nd filled, and the silicon surface is in direct contact with the silicon surface 2nd 2nd metal or metal alloy cover.
[claim2]
2. Composite material according to claim 1, wherein, a non-through-hole is provided with a granular form dispersed in it, the island-shaped or film-like 1st metal immersed in a solution containing fluoride ions in the silicon surface is formed.
[claim3]
3. Composite material according to claim 1, wherein, through non-penetrating pores of the silicon surface is porous.
[claim4]
4. Claim 1 to 3 composite material, wherein, from 1st metal is palladium (Pd), silver (Ag), gold (Au), platinum (Pt) and rhodium (Rh) at least one metal selected.
[claim5]
5. Composite material according to claim 1, wherein, from the silicon is monocrystalline silicon, polycrystalline silicon, microcrystalline and amorphous silicon at least one material selected.
  • 出願人(英語)
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • 発明者(英語)
  • YAE SHINJI
  • HIRANO TATSUYA
  • MATSUDA HITOSHI
国際特許分類(IPC)
参考情報 (研究プロジェクト等) CREST Development of Advanced Nanostructured Materials for Energy Conversion and Storage AREA
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