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Nucleic acid-containing polymeric micelle complex and method of manufacturing the same NEW

外国特許コード F170009168
整理番号 K10503TW
掲載日 2017年9月12日
出願国 台湾
出願番号 103126841
公報番号 201536351
公報番号 I565479
出願日 平成26年8月6日(2014.8.6)
公報発行日 平成27年10月1日(2015.10.1)
公報発行日 平成29年1月11日(2017.1.11)
優先権データ
  • 特願2013-163106 (2013.8.6) JP
発明の名称 (英語) Nucleic acid-containing polymeric micelle complex and method of manufacturing the same NEW
発明の概要(英語) (TWI565479)
A nucleic acid-containing polymeric micelle complex of the present invention comprises an uncharged hydrophilic polymer chain block and a block copolymer containing cationic polymer chain block; and two single-strand DNAs having 1000 bases or more and containing complementary base sequences each other, a double-strand DNA having 1000 base pairs or more, wherein at least a part of the double helix is dissociated and forms a single chain structure, or a single-strand DNA having 1000 bases or more.
特許請求の範囲(英語) [claim1]
1. Kinds of intension nucleic acid's high polymer micelle complexes, its characteristic for by including the non-electric charge water affinity high polymer chain block and positive ion high polymer chain block's block copolymer, and is contained above 2nd single laid DNA 1000 basic group length each other supplementary basic group sequence, at least one of part of dissociation double helix structures to become the single laid structure 1000 basic groups above double strand DNA to the length, or above 1 of single laid DNA 1000 basic group lengths forms.
[claim2]
2. Like the request item of 1 intension nucleic acid's high polymer micelle complex, it is by including the non-electric charge water affinity high polymer chain block and positive ion high polymer chain block block copolymer, and contains 2 single laid DNA that above 1000 basic group lengths each other supplementary basic group sequence becomes, or at least one of part of dissociation double helix structures becomes the single laid structure 1000 basic groups above double strand DNA to the length to form.
[claim3]
3. Like request item 1 or 2 intension nucleic acid high polymer micelle complex, above single laid DNA is above 2000 basic group lengths, above double strand DNA is 2000 basic groups to the length above.
[claim4]
4. Like request item 1 or 2 intension nucleic acid high polymer micelle complex, in the river character media the use dynamic light scattering method's average grain diameters are below 100nm.
[claim5]
5. Like request item 1 or 2 intension nucleic acid high polymer micelle complex, DNA and because of static electricity interaction but with the DNA union's positive ion high polymer chain block forms the core part, the non-electric charge water affinity high polymer chain block forms the shell part.
[claim6]
6. Like request item of 5 intension nucleic acid high polymer micelle complexes, the above core part the average grain diameters are below 50nm.
[claim7]
7. Like request item 1 or 2 intension nucleic acid's high polymer micelle complex, it is the spheroid shape.
[claim8]
8. Like request item 1 or 2 intension nucleic acid high polymer micelle complex, above single laid DNA or above double strand DNA are the striations.
[claim9]
9. Like request item 1 or 2 intension nucleic acid high polymer micelle complex, at least of a sub-system above block copolymers each other crosses linking.
[claim10]
10. Like request item 1 or 2 intension nucleic acid high polymer micelle complex, in the principal chain or side chain above positive ion high polymer chain block, covalent bond knot hydrophobic base.
[claim11]
11. Like request item 1 either 2 intension nucleic acid's high polymer micelle complex, it has the ethyl group amine structure or the propyl amine structure in the side chain of above positive ion high polymer chain block.
[claim12]
12. 1 intension nucleic acid the manufacture of method of high polymer micelle complex, it is the manufacture accepts DNA intension nucleic acid the method of high polymer micelle complex, its characteristic to have the following step: Will include the non-electric charge water affinity high polymer chain block and positive ion high polymer chain block block copolymer, and causes 1000 basic groups' at least one of part of dissociation double helix structures condition double strand DNA to above, performs to mix in the river character media.
[claim13]
13. Like request item of 12 intension nucleic acid the manufacture of method of high polymer micelle complex, above double strand DNA is 2000 basic groups to the length above.
[claim14]
14. Like request item 12 or 13 intension nucleic acid the manufacture of method of high polymer micelle complex, above double strand DNA is the striation.
[claim15]
15. Like request item 12 or 13 intension nucleic acid the manufacture of method of high polymer micelle complex, above double strand DNA is causes his transsexual over 60℃.
  • 出願人(英語)
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • 発明者(英語)
  • KATAOKA KAZUNORI
  • OSADA KENSUKE
  • TOCKARY THEOFILUS AGRIOS
国際特許分類(IPC)
参考情報 (研究プロジェクト等) PRESTO Molecular technology and creation of new functions AREA
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