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Cell-seeding and -culturing device

Foreign code F170009189
File No. AF19-09WO
Posted date Sep 12, 2017
Country United States of America
Application number 201515113153
Gazette No. 20170002315
Date of filing Jan 23, 2015
Gazette Date Jan 5, 2017
International application number JP2015051905
International publication number WO2015111722
Date of international filing Jan 23, 2015
Date of international publication Jul 30, 2015
Priority data
  • P2014-011640 (Jan 24, 2014) JP
  • 2015WO-JP51905 (Jan 23, 2015) WO
Title Cell-seeding and -culturing device
Abstract (US20170002315)
Provided is a device for seeding cells in a plurality of cell arrangement areas in a simple manner and a short period of time.
A seeding and culturing device (1) for cells capable of forming a nerve network, the device comprising a cell-culturing substrate (2) having a plurality of cell arrangement areas (8) enclosed by a plurality of projecting parts, and a flow channel substrate (3) arranged on the cell-cultivating substrate (2) and having a plurality of through-holes (14), wherein the through-holes (14) are configured so as to provide flow channels in which the upper surface side of the substrate is an entrance (15) and the lower surface side of the substrate is an exit, and the exit (16) of the flow channels is positioned above any of the cell arrangement areas.
Scope of claims [claim1]
1.-7. (canceled)
[claim2]
8. A cell seeding and culturing device capable of forming a nerve cell network, comprising: a cell culturing substrate capable of forming a nerve cell network, having a plurality of cell arrangement areas surrounded by a plurality of projections, which inhibit cell moving and loss; and
a flow channel substrate having a plurality of through holes through which cells are allowed to pass, and being arranged on the culturing substrate, wherein each of the through holes defines a flow channel, wherein the upper side of the substrate is an entrance and the lower side of the substrate is an exit, wherein the flow channel is tapered from an entrance to an exit so as to seed cells, the exit of each flow channel is located above the cell arrangement areas, and the size of the exit is smaller than that of the cell arrangement area.
[claim3]
9. The cell seeding and culturing device according to claim 8, which is characterized in that the flow channel which is tapered from an entrance to an exit so as to seed cells have a sufficient slope so as to avoid remaining of cells on the slope.
[claim4]
10. The cell seeding and culturing device according to claim 9, wherein the flow channel substrate has a thickness, which enables the formation of slope which is steep enough to avoid remaining of cells on the slope in the flow channel which is tapered from an entrance to an exit so as to seed cells.
[claim5]
11. The cell seeding and culturing device according to claim 8, wherein the entrance of the flow channel for seeding cells is 100-500 um, the exit is 20-50 um, and the thickness of the flow channel substrate is 0.2 mm-5 mm.
[claim6]
12. The cell seeding and culturing device according to claim 8, wherein the internal diameter of cell retainer which is configured from a plurality of projections which inhibit cell moving and loss is 10-25 um.
[claim7]
13. The cell seeding and culturing device according to claim 8, wherein the height of the projections is 5-15 um.
[claim8]
14. The cell seeding and culturing device according to claim 8, which enables to place one to several cells on a cell arrangement area.
[claim9]
15. The cell seeding and culturing device according to claim 8, wherein the flow channel substrate is removed from the culturing substrate after cell establishment.
[claim10]
16. The cell seeding and culturing device according to claim 8, wherein a spacer member having a thickness greater than the height of the projections is arranged between the culturing substrate and the flow channel substrate.
[claim11]
17. The cell seeding and culturing device according to claim 8, having a gap which enables to form a nerve cell network between the cell arrangement areas between the culturing substrate and the flow channel substrate, and which corresponds to the thickness of the spacer member.
[claim12]
18. The cell seeding and culturing device according to claim 8, wherein a gap through which cells flow out is not present between the exits of the flow channels and the projections.
[claim13]
19. The cell seeding and culturing device according to claim 8, further comprising a liquid storage substrate that defines a liquid storage area on the upper surface of the flow channel substrate.
[claim14]
20. The cell seeding and culturing device according to claim 8, wherein the culturing substrate is an electrically insulated substrate used in a planar patch-clamp method, and has through holes for the planar patch-clamp method in the cell arrangement areas that do not allow the passage of cells but allow the attaining of electrical continuity.
[claim15]
21. The cell seeding and culturing device according to claim 8, wherein the culturing substrate is a substrate for imaging a nerve cell network.
[claim16]
22. A cell seeding and culturing device capable of forming a nerve cell network, comprising: a cell culturing substrate capable of forming a nerve cell network, having a plurality of cell arrangement areas surrounded by a plurality of projections having 5-15 um height which inhibit cell moving and loss, the internal diameter of which is 10-25 um; and
a flow channel substrate having 0.2 mm-5 mm thickness and having a plurality of through holes through which cells are allowed to pass, and being arranged on the culturing substrate,
wherein each of the through holes defines a flow channel, wherein the upper side of the substrate is an entrance having 100-500 um and the lower side of the substrate is an exit having 20-50 um, wherein the flow channel is tapered from an entrance to an exit so as to seed cells, the exit of each flow channel is located above the cell arrangement areas, and the size of the exit is smaller than that of the cell arrangement area.
  • Inventor, and Inventor/Applicant
  • URISU TSUNEO
  • WANG ZHI-HONG
  • UNO HIDETAKA
  • NAGAOKA YASUTAKA
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
IPC(International Patent Classification)
Reference ( R and D project ) CREST Creation of Nanosystems with Novel Functions through Process Integration AREA
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