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METHOD FOR PRODUCING GRAPHENE FILM, METHOD FOR MANUFACTURING ELECTRONIC ELEMENT, AND METHOD FOR TRANSFERRING GRAPHENE FILM TO SUBSTRATE

Foreign code F110003206
File No. K02909WO
Posted date 2011年6月22日
Country 世界知的所有権機関(WIPO)
International application number 2010JP054602
International publication number WO 2010/110153
Date of international filing 平成22年3月17日(2010.3.17)
Date of international publication 平成22年9月30日(2010.9.30)
Priority data
  • 特願2009-080307 (2009.3.27) JP
Title METHOD FOR PRODUCING GRAPHENE FILM, METHOD FOR MANUFACTURING ELECTRONIC ELEMENT, AND METHOD FOR TRANSFERRING GRAPHENE FILM TO SUBSTRATE
Abstract Disclosed is a method for producing a graphene film, by which a graphene film having a large area can be produced without requiring high temperatures. Also disclosed is a method for manufacturing an electronic element, wherein an FET circuit pattern can be easily formed on an electronic element substrate by means of a resist. The method for manufacturing an electronic element can be easily applied to an area-increasing process by integrating elements. Also disclosed is a method for transferring a graphene film to a substrate, wherein a graphene film having a large area can be isolated and a graphene film of a desired size can be transferred to a desired position of a substrate. The method for producing a graphene film is characterized by comprising a step wherein an amorphous carbon film is brought into contact with a liquid metal such as gallium, so that a graphene film is formed on the contact interface.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • Inventor
  • FUJITA Jun-ichi
IPC(International Patent Classification)
Reference ( R and D project ) PRESTO Search for nanomanufacturing technology and its development AREA
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