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FUNCTIONAL DEVICE AND FUNCTIONAL DEVICE MANUFACTURING METHOD 新技術説明会

Foreign code F150008095
File No. AF19-05WO
Posted date 2015年1月26日
Country 世界知的所有権機関(WIPO)
International application number 2013JP076271
International publication number WO 2014051054
Date of international filing 平成25年9月27日(2013.9.27)
Date of international publication 平成26年4月3日(2014.4.3)
Priority data
  • 特願2012-216267 (2012.9.28) JP
Title FUNCTIONAL DEVICE AND FUNCTIONAL DEVICE MANUFACTURING METHOD 新技術説明会
Abstract This functional device (and functional device manufacturing method) is formed by being provided with the following: a first substrate in which a groove is formed on one surface thereof; a second substrate provided integrally with the first substrate so that one surface of each is joined to the other, and which forms a flow channel with the groove of the first substrate; and at least one modification object that is disposed so as to modify a portion of the inner surface of the flow channel and is selected from among a trap body that is for trapping a target substance provided in the flow channel, an electrode that imparts an electrical effect on the target substance, or a catalyst that imparts a chemical effect on the target substance. The functional device is characterized by having formed therein a section in which surfaces of the first substrate and the second substrate are joined to each other by the bonding of silica and fluorine.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • Inventor
  • KITAMORI TAKEHIKO
  • MAWATARI KAZUMA
IPC(International Patent Classification)
Reference ( R and D project ) CREST Creation of Nanosystems with Novel Functions through Process Integration AREA
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