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PHOTOREACTIVE COMPOSITION, REACTION PRODUCT, AND METHOD FOR PRODUCING REACTION PRODUCT NEW

外国特許コード F200010015
整理番号 (S2018-0616-N0)
掲載日 2020年1月30日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2019JP018289
国際公開番号 WO 2019216321
国際出願日 令和元年5月7日(2019.5.7)
国際公開日 令和元年11月14日(2019.11.14)
優先権データ
  • 特願2018-089280 (2018.5.7) JP
発明の名称 (英語) PHOTOREACTIVE COMPOSITION, REACTION PRODUCT, AND METHOD FOR PRODUCING REACTION PRODUCT NEW
発明の概要(英語) This photoreactive composition comprises: a base-reactive compound; a photo-base generator that is represented by general formula (1) and that generates a base as a result of being irradiated with light; and at least one compound selected from the group consisting of polycyclic aromatic compounds having a condensed ring structure of two or more rings and polycyclic aromatic compounds that comprise three or more aromatic rings and that have a conjugated structure including two or more of the aromatic rings among the three or more aromatic rings. The polarity of the base-reactive compound is converted by the action of a base and said base-reactive compound is a compound having two or more reactive groups in each molecule thereof or a compound having two or more groups that react as a result of the action of a base in each molecule thereof.
従来技術、競合技術の概要(英語) BACKGROUND ART
By the irradiation of the photopolymerizable material is polymerized, a polymerization reaction in a relatively simple operation can be precisely controlled from, and is widely put into practical use, for example, the field of electronic materials, printing materials occupy an important position in the field or the like. Photopolymerizable materials include, for example, a radical species by exposure to light generated in the initiator, the radical polymerizable monomer or oligomer, a resin composition containing a radical polymerization system, photo-acid generating agent generating acid by exposure and, by the action of an acid and the polymerizable monomer or oligomer, a resin composition containing an acid catalyst and the like of the system, it has been studied actively.
On the other hand, as the photopolymerizable material, generates a base by exposure and the photobase generator, the polymerizable monomer or oligomer by the action of the base, the base containing catalyst system are also known. Then, the photobase generators include, for example, strong bases such as guanidine salt and carboxylic acid-type ions corresponding to known (for example, see Non-Patent Document 1). Such ionic the photobase generator, a carboxyl group by exposure and decarboxylation reaction in progress, the carboxyl group forming a salt with a strong base can be not free, the generated base.
However, such ionic the photobase generator, although a high reactivity, the stability during storage is low, moreover, the problem of low solubility. Further, such an ion optical base generating agent may be a resin composition, was a problem of low stability.
On the other hand, non-ion-type of the photobase generator have been studied also. The non-ion type as the photobase generator, for example, nitrobenzyl carbamate and the skeleton, the decarboxylation reaction and the exposure, the second tertiary amine or a tertiary amine is 1 to 2 in the first free, the occurrence of the bases has been known (for example, see Non-Patent Document 2). Such non-ion type in the photobase generator, photobase generator-ion type as described above are eliminated and the problem of the.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • TOKYO UNIVERSITY OF SCIENCE EDUCATIONAL FOUNDATION
  • 発明者(英語)
  • ARIMITSU Koji
国際特許分類(IPC)
指定国 National States: AE AG AL AM AO AT AU AZ BA BB BG BH BN BR BW BY BZ CA CH CL CN CO CR CU CZ DE DJ DK DM DO DZ EC EE EG ES FI GB GD GE GH GM GT HN HR HU ID IL IN IR IS JO JP KE KG KH KN KP KR KW KZ LA LC LK LR LS LU LY MA MD ME MG MK MN MW MX MY MZ NA NG NI NO NZ OM PA PE PG PH PL PT QA RO RS RU RW SA SC SD SE SG SK SL SM ST SV SY TH TJ TM TN TR TT TZ UA UG US UZ VC VN ZA ZM ZW
ARIPO: BW GH GM KE LR LS MW MZ NA RW SD SL SZ TZ UG ZM ZW
EAPO: AM AZ BY KG KZ RU TJ TM
EPO: AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
OAPI: BF BJ CF CG CI CM GA GN GQ GW KM ML MR NE SN ST TD TG
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