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PHOTOREACTIVE COMPOSITION, REACTION PRODUCT, AND METHOD FOR PRODUCING REACTION PRODUCT

Foreign code F200010015
File No. (S2018-0616-N0)
Posted date Jan 30, 2020
Country WIPO
International application number 2019JP018289
International publication number WO 2019216321
Date of international filing May 7, 2019
Date of international publication Nov 14, 2019
Priority data
  • P2018-089280 (May 7, 2018) JP
Title PHOTOREACTIVE COMPOSITION, REACTION PRODUCT, AND METHOD FOR PRODUCING REACTION PRODUCT
Abstract This photoreactive composition comprises: a base-reactive compound; a photo-base generator that is represented by general formula (1) and that generates a base as a result of being irradiated with light; and at least one compound selected from the group consisting of polycyclic aromatic compounds having a condensed ring structure of two or more rings and polycyclic aromatic compounds that comprise three or more aromatic rings and that have a conjugated structure including two or more of the aromatic rings among the three or more aromatic rings. The polarity of the base-reactive compound is converted by the action of a base and said base-reactive compound is a compound having two or more reactive groups in each molecule thereof or a compound having two or more groups that react as a result of the action of a base in each molecule thereof.
Outline of related art and contending technology BACKGROUND ART
By the irradiation of the photopolymerizable material is polymerized, a polymerization reaction in a relatively simple operation can be precisely controlled from, and is widely put into practical use, for example, the field of electronic materials, printing materials occupy an important position in the field or the like. Photopolymerizable materials include, for example, a radical species by exposure to light generated in the initiator, the radical polymerizable monomer or oligomer, a resin composition containing a radical polymerization system, photo-acid generating agent generating acid by exposure and, by the action of an acid and the polymerizable monomer or oligomer, a resin composition containing an acid catalyst and the like of the system, it has been studied actively.
On the other hand, as the photopolymerizable material, generates a base by exposure and the photobase generator, the polymerizable monomer or oligomer by the action of the base, the base containing catalyst system are also known. Then, the photobase generators include, for example, strong bases such as guanidine salt and carboxylic acid-type ions corresponding to known (for example, see Non-Patent Document 1). Such ionic the photobase generator, a carboxyl group by exposure and decarboxylation reaction in progress, the carboxyl group forming a salt with a strong base can be not free, the generated base.
However, such ionic the photobase generator, although a high reactivity, the stability during storage is low, moreover, the problem of low solubility. Further, such an ion optical base generating agent may be a resin composition, was a problem of low stability.
On the other hand, non-ion-type of the photobase generator have been studied also. The non-ion type as the photobase generator, for example, nitrobenzyl carbamate and the skeleton, the decarboxylation reaction and the exposure, the second tertiary amine or a tertiary amine is 1 to 2 in the first free, the occurrence of the bases has been known (for example, see Non-Patent Document 2). Such non-ion type in the photobase generator, photobase generator-ion type as described above are eliminated and the problem of the.
Scope of claims (In Japanese)[請求項1]
 塩基反応性化合物と、
 下記一般式(1)で表され、光を照射することにより塩基を発生する光塩基発生剤と、
 2環以上の縮合環構造を有する多環芳香族化合物、及び、3つ以上の芳香環を有し、前記3つ以上の芳香環の内、2つ以上の芳香環を含む共役構造を有する多環芳香族化合物からなる群より選択される少なくとも1つの化合物と、を含有し、
 前記塩基反応性化合物が、塩基の作用により極性が変換され、反応性を示す基を1分子中に2個以上有する化合物、又は塩基の作用により反応する基を1分子中に2個以上有する化合物である、光反応性組成物。
[化1]
(省略)
(一般式(1)中、Gは2価の芳香族基であり;Xは下記一般式(1)-11、(1)-12、(1)-13、(1)-14又は(1)-15で表される基である。)
[化2]
(省略)
(一般式(1)-11~一般式(1)-15中、R 11、R 12、R 13、R 22、R 23、R 24、R 32、R 33、R 41、R 42、R 43及びR 44は、それぞれ独立に水素原子又は炭化水素基であり;R 21、R 31、R 51及びR 52は、それぞれ独立に炭化水素基であり;R 11、R 12及びR 13のうちの2種以上が炭化水素基である場合、これら炭化水素基は相互に結合して環を形成していてもよく、R 21、R 22、R 23及びR 24のうちの2種以上が炭化水素基である場合、これら炭化水素基は相互に結合して環を形成していてもよく、R 31、R 32及びR 33のうちの2種以上が炭化水素基である場合、これら炭化水素基は相互に結合して環を形成していてもよく、R 41、R 42、R 43及びR 44のうちの2種以上が炭化水素基である場合、これら炭化水素基は相互に結合して環を形成していてもよく、R 51及びR 52は相互に結合して環を形成していてもよく;符号*を付した結合は、Xの結合先である炭素原子に対して形成されている。)

[請求項2]
 前記2環以上の縮合環構造を有する多環芳香族化合物は、3つ以上の環構造を有する請求項1に記載の光反応性組成物。

[請求項3]
 前記2環以上の縮合環構造を有する多環芳香族化合物は、アントラキノン、チオキサントン、アントラセン及びこれらの誘導体からなる群より選択される少なくとも1種である請求項1又は請求項2に記載の光反応性組成物。

[請求項4]
 前記3つ以上の芳香環を有し、前記3つ以上の芳香環の内、2つ以上の芳香環を含む共役構造を有する多環芳香族化合物は、ベンゾフェノン誘導体であり、
 前記ベンゾフェノン誘導体は、ベンゾフェノン骨格における芳香環を構成する少なくとも1つの炭素原子が、直接又は2価の連結基を介して芳香環と結合している化合物である請求項1~請求項3のいずれか1項に記載の光反応性組成物。

[請求項5]
 請求項1~請求項4のいずれか1項に記載の光反応性組成物を反応させて得られる反応生成物。

[請求項6]
 請求項1~請求項4のいずれか1項に記載の光反応性組成物に光を照射して前記光塩基発生剤から前記塩基を発生させる工程を含む反応生成物の製造方法。

[請求項7]
 前記光反応性組成物に300nm以上の波長の光を照射する請求項6に記載の反応生成物の製造方法。
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • TOKYO UNIVERSITY OF SCIENCE EDUCATIONAL FOUNDATION
  • Inventor
  • ARIMITSU Koji
IPC(International Patent Classification)
Specified countries National States: AE AG AL AM AO AT AU AZ BA BB BG BH BN BR BW BY BZ CA CH CL CN CO CR CU CZ DE DJ DK DM DO DZ EC EE EG ES FI GB GD GE GH GM GT HN HR HU ID IL IN IR IS JO JP KE KG KH KN KP KR KW KZ LA LC LK LR LS LU LY MA MD ME MG MK MN MW MX MY MZ NA NG NI NO NZ OM PA PE PG PH PL PT QA RO RS RU RW SA SC SD SE SG SK SL SM ST SV SY TH TJ TM TN TR TT TZ UA UG US UZ VC VN ZA ZM ZW
ARIPO: BW GH GM KE LR LS MW MZ NA RW SD SL SZ TZ UG ZM ZW
EAPO: AM AZ BY KG KZ RU TJ TM
EPO: AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
OAPI: BF BJ CF CG CI CM GA GN GQ GW KM ML MR NE SN ST TD TG
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