Top > Search of International Patents > POLYIMIDE, PRODUCTION METHOD OF POLYIMIDE, SEPARATION FILM, PRODUCTION METHOD OF SEPARATION FILM, AND GAS SEPARATION METHOD

POLYIMIDE, PRODUCTION METHOD OF POLYIMIDE, SEPARATION FILM, PRODUCTION METHOD OF SEPARATION FILM, AND GAS SEPARATION METHOD

Foreign code F200010075
File No. 5939
Posted date May 15, 2020
Country WIPO
International application number 2018JP048438
International publication number WO 2019138932
Date of international filing Dec 28, 2018
Date of international publication Jul 18, 2019
Priority data
  • P2018-002756 (Jan 11, 2018) JP
Title POLYIMIDE, PRODUCTION METHOD OF POLYIMIDE, SEPARATION FILM, PRODUCTION METHOD OF SEPARATION FILM, AND GAS SEPARATION METHOD
Abstract The present invention is intended to provide a polyimide having a new structure that can be produced at low cost. In order to achieve the aforementioned object, the present invention provides a polyimide or salt thereof, including: a structure represented by the following chemical formula (I): wherein in the chemical formula (I), Ar11, Ar12, and Ar20 each are an atomic group including at least one selected from the group consisting of an aromatic ring, a heteroaromatic ring, a non-aromatic ring, and a non-ring structure, and may further include a substituent, Sp is a spiro ring and may further include a substituent, and n is a positive integer and denotes a degree of polymerization.
Outline of related art and contending technology Background Art
Polyimides are used in the fields of a gas separation film and the like (for example, Non-Patent Literature 1).
Citation List
Non-Patent Literature
Yampolskii et al, Macromolecules 2009, 42, 7881-7888.
TECHNICAL PROBLEM
Conventional polyimides, however, have a problem of high cost in production because of a number of synthesis steps and high cost of raw materials, and the like, for example.
Hence, the present invention is intended to provide a polyimide having a new structure that can be produced at low cost.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • KYOTO UNIVERSITY
  • Inventor
  • SIVANIAH, Easan
  • SHRESTHA, Binod Babu
IPC(International Patent Classification)
Specified countries National States: AE AG AL AM AO AT AU AZ BA BB BG BH BN BR BW BY BZ CA CH CL CN CO CR CU CZ DE DJ DK DM DO DZ EC EE EG ES FI GB GD GE GH GM GT HN HR HU ID IL IN IR IS JO KE KG KH KN KP KR KW KZ LA LC LK LR LS LU LY MA MD ME MG MK MN MW MX MY MZ NA NG NI NO NZ OM PA PE PG PH PL PT QA RO RS RU RW SA SC SD SE SG SK SL SM ST SV SY TH TJ TM TN TR TT TZ UA UG US UZ VC VN ZA ZM ZW
ARIPO: BW GH GM KE LR LS MW MZ NA RW SD SL SZ TZ UG ZM ZW
EAPO: AM AZ BY KG KZ RU TJ TM
EPO: AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
OAPI: BF BJ CF CG CI CM GA GN GQ GW KM ML MR NE SN ST TD TG
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