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COMPOUND, LIGHT EMITTING MATERIAL AND ORGANIC LIGHT EMITTING ELEMENT NEW

外国特許コード F200010087
整理番号 5769
掲載日 2020年5月15日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2018JP017704
国際公開番号 WO 2018207750
国際出願日 平成30年5月8日(2018.5.8)
国際公開日 平成30年11月15日(2018.11.15)
優先権データ
  • 特願2017-092244 (2017.5.8) JP
発明の名称 (英語) COMPOUND, LIGHT EMITTING MATERIAL AND ORGANIC LIGHT EMITTING ELEMENT NEW
発明の概要(英語) A compound represented by general formula (1a) or general formula (1b) according to the present invention is a light emitting material which has excellent heat resistance, and which is able to form a film by a coating method. In the general formulae, R1 and R2 represent aliphatic groups, and at least one of R1 and R2 represents a polycyclic aliphatic group; each of A1-A5 represents N or C-R3 (wherein R3 represents a hydrogen atom or a substituent), and at least one of A1-A5 represents C-R3 (wherein R3 represents a donor group); each of A6-A8 represents N or C-R4 (wherein R4 represents a hydrogen atom or an alkyl group), and at least one of A6-A8 represents N; and D represents a donor linking group. AA General formula
従来技術、競合技術の概要(英語) BACKGROUND ART
Organic light-emitting material that comprises no inorganic atoms, molecular design for a high degree of freedom, various characteristics can be controlled. Also, a naturally occurring carbon atoms present in an adaptor or a hydrogen atom, a nitrogen atom or the like and hence, the material cost is inexpensive and has an advantage. Therefore, the organic light emitting material that comprises no inorganic atoms and have garnered attention. Such an organic light emitting material is used in the case of forming the light-emitting layer of the light emitting element, a vacuum evaporation method is generally used. However, a vacuum vapor deposition method is vacuum deposition equipment is required and the scale of, other than the vacuum deposition is performed and the deposition particles adhere to the substrate, and the material that is wasted. Therefore, the light emitting element is manufactured by a vacuum deposition method, a problem that the manufacturing cost is increased. Also, in particular, applied to a large display a large area may be formed of a light emitting layer, a film having a uniform thickness over the whole since it is difficult to control, out of a defective non-uniform film thickness is reduced and the yield is also a problem that. Therefore, a simple film formation can be performed efficiently, in addition, a large area even in the case of forming a light emitting layer, over the entire film thickness can be controlled easily as a film formation method, coating method of the light emitting device is introduced into the manufacturing step has been discussed (for example, Patent Document 1, the reference 2.).
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • KYOTO UNIVERSITY
  • 発明者(英語)
  • KAJI Hironori
  • WADA Yoshimasa
  • KUBO Shosei
国際特許分類(IPC)
指定国 National States: AE AG AL AM AO AT AU AZ BA BB BG BH BN BR BW BY BZ CA CH CL CN CO CR CU CZ DE DJ DK DM DO DZ EC EE EG ES FI GB GD GE GH GM GT HN HR HU ID IL IN IR IS JO JP KE KG KH KN KP KR KW KZ LA LC LK LR LS LU LY MA MD ME MG MK MN MW MX MY MZ NA NG NI NO NZ OM PA PE PG PH PL PT QA RO RS RU RW SA SC SD SE SG SK SL SM ST SV SY TH TJ TM TN TR TT TZ UA UG US UZ VC VN ZA ZM ZW
ARIPO: BW GH GM KE LR LS MW MZ NA RW SD SL SZ TZ UG ZM ZW
EAPO: AM AZ BY KG KZ RU TJ TM
EPO: AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
OAPI: BF BJ CF CG CI CM GA GN GQ GW KM ML MR NE SN ST TD TG
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