TOP > 外国特許検索 > Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate

Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate NEW

外国特許コード F200010266
整理番号 K03511US2
掲載日 2020年11月9日
出願国 アメリカ合衆国
出願番号 202016818003
公報番号 20200223125
出願日 令和2年3月13日(2020.3.13)
公報発行日 令和2年7月16日(2020.7.16)
優先権データ
  • 特願2012-266628 (2012.12.5) JP
  • 2013JP80635 (2013.11.13) WO
  • US2014649735 (2015.6.4) 15
発明の名称 (英語) Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate NEW
発明の概要(英語) Provided is a resin for nanoimprinting, which is capable of preventing removal of a transfer-receiving resin from a substrate when a mold is separated during nanoimprinting, and which is also capable of transferring a pattern on a mold to a transfer-receiving resin with high accuracy during thermal nanoimprinting, while improving the throughput. A resin for nanoimprinting, which is represented by formula (1).
-
- (In the formula, each of R1-R5 independently represents —H or —OH, and at least one of the R1-R5 moieties represents —OH; R6 represents a linear, branched or cyclic alkyl group having 1-20 carbon atoms, an aryl group having 6-20 carbon atoms or an aralkyl group having 7-20 carbon atoms; X represents an amide or an ester; Y may be absent, or represents an amide or an ester; P represents an integer of 1-10; and each of m and n represents an integer of 1 or more.)
従来技術、競合技術の概要(英語) BACKGROUND
As information technology has advanced in recent years, demand has increased for high-speed operation, low-power-consuming operation, the functional integration known as “system LSI,” and other advanced technologies brought about by further miniaturization of semiconductor devices. Continued miniaturization of lithographic technology, which is the core technology behind semiconductor devices, presents problems in that the initial cost of lithography devices increases exponentially, and the price of masks for obtaining the same degree of resolution as that of the light wavelength used also rises.
Nanoimprint lithography, proposed by Chou et al. of Princeton University in 1995, has drawn attention as a processing technique having a resolution of 10 nm while being inexpensive. Nanoimprinting is a technique in which a mold is pressed on a transfer-receiving resin layer provided on a substrate, and a nanometer-order pattern formed on the mold is transferred to the transfer-receiving resin layer; fine patterns can be formed using this technique at a lower cost than with existing lithography techniques, making this technique applicable to semiconductor devices and other electronic devices, optical devices, recording media, chemical/biological devices, MEMS, and other industrial machines.
Thermal nanoimprinting and optical nanoimprinting common methods for nanoimprinting; these methods are differentiated by the properties of the transfer-receiving resin. Of these methods, thermal nanoimprinting comprises applying polymethylmethacrylate (PMMA) or another thermoplastic resin to a substrate as a transfer-receiving resin, heating the transfer-receiving resin to or above the glass transition temperature thereof (105° C. for PMMA) and pressing a mold thereagainst, and removing the mold and the substrate after cooling same, whereby a pattern on the mold is transferred to the transfer-receiving resin.
However, in addition to the problem of shared nanoimprinting, in which, when (3) a mold 3 is detached after (2) being pressed against (1) a transfer-receiving resin 2 applied to a substrate 1 as shown in FIG. 1, the transfer-receiving resin 2 detaches together with the mold 3, thermal nanoimprinting presents other problems in that heating and cooling the transfer-receiving resin takes time, reducing throughput.
Applying the transfer-receiving resin to a glass substrate after treating the substrate with a silane coupling agent (see non-patent reference 1), and causing a benzophenone derivative containing a thiol to react with a gold coating on a substrate before forming a polystyrene resin layer as a transfer-receiving resin (see non-patent reference 2), are known as methods for overcoming the problems described above. However, the method described in non-patent reference 1 presents problems in that the material of the substrate is limited to glass due to the silane coupling agent treatment, and the method described in non-patent reference 2 presents problems in that the gold coating is necessary and the combination of substrate and transfer-receiving resin is limited.
特許請求の範囲(英語) [claim1]
1. A laminate comprising a nanoimprinting resin, wherein the nanoimprinting resin is used between a substrate and a transfer-receiving resin to which a mold is to be transferred, and wherein the nanoimprinting resin is represented by formula (1) below,
wherein in the formula, each of R1-R5 independently represents —H or —OH, with at least two of R1-R5 representing —OH being adjacent to each other, R6 represents a C1-20 linear, branched, or cyclic alkyl group, a C6-20 aryl group, or a C7-20 aralkyl group, X represents an amide or an ester, Y represents an amide or an ester, or may be absent, P represents an integer from 1 to 10, m and n are integers equal to or greater than 1, and
wherein when Y is an ester, R6 represents a C1-3 linear alkyl group, or a C5-20 linear alkyl group, or a C1-20 branched or cyclic alkyl group, or a C6-20 aryl group, or a C7-20 aralkyl group.

[claim2]
2. The laminate of claim 1, wherein R6 of the nanoimprinting resin represents a C1-3 linear alkyl group or a C5-20 linear alkyl group, or a C1-20 branched or cyclic alkyl group, or a C6-20 aryl group, or a C7-20 aralkyl group.

[claim3]
3. The laminate of claim 1, wherein m and n have a ratio such that m:n=1:99-90:10.

[claim4]
4. The laminate of claim 1, wherein two of the R1-R5 of the nanoimprinting resin represent —OH.

[claim5]
5. The laminate of claim 1, wherein the transfer-receiving resin forms a nanometer-order pattern from a mold by receiving the nanometer-order pattern transferred from the mold onto the transfer-receiving resin on a layer of nanoimprinting resin.

[claim6]
6. A substrate comprising a nanoimprinting resin,
wherein the nanoimprinting resin is used between a substrate and a transfer-receiving resin to which a mold is to be transferred, and
wherein the nanoimprinting resin is represented by formula (1) below,
wherein in the formula, each of R1-R5 independently represents —H or —OH, with at least two of R1-R5 representing —OH being adjacent to each other, R6 represents a C1-20 linear, branched, or cyclic alkyl group, a C6-20 aryl group, or a C7-20 aralkyl group, X represents an amide or an ester, Y represents an amide or an ester, or may be absent, P represents an integer from 1 to 10, m and n are integers equal to or greater than 1, and
wherein when Y is an ester, R6 represents a C1-3 linear alkyl group, or a C5-20 linear alkyl group, or a C1-20 branched or cyclic alkyl group, or a C6-20 aryl group, or a C7-20 aralkyl group.

[claim7]
7. The substrate of claim 6, wherein R6 of the nanoimprinting resin represents a C1-3 linear alkyl group or a C5-20 linear alkyl group, or a C1-20 branched or cyclic alkyl group, or a C6-20 aryl group, or a C7-20 aralkyl group.

[claim8]
8. A method for manufacturing a nanoimprinting substrate, comprising:
a step of laminating a nanoimprinting resin onto a substrate, and
a step of laminating a layer to which a pattern from a mold is to be transferred on a layer of the nanoimprinting resin, and a step of transferring the pattern from the mold, and wherein the nanoimprinting resin is represented by formula (1) below,
wherein in the formula, each of R1-R5 independently represents —H or —OH, with at least two of R1-R5 representing —OH being adjacent to each other, R6 represents a C1-20 linear, branched, or cyclic alkyl group, a C6-20 aryl group, or a C7-20 aralkyl group, X represents an amide or an ester, Y represents an amide or an ester, or may be absent, P represents an integer from 1 to 10, m and n are integers equal to or greater than 1.

[claim9]
9. The method for manufacturing a nanoimprinting substrate of claim 8, wherein the layer to which the pattern from the mold is to be transferred is a thermoplastic resin, and the steps for transferring the pattern from the mold comprise:
a step for heating the substrate on which the thermoplastic resin is laminated to a temperature higher than the glass transition temperature of the thermoplastic resin,
a step for pressing the mold,
a step for cooling the substrate to a temperature lower than the glass transition temperature of the thermoplastic resin, and
a step for detaching the mold.

[claim10]
10. The method for manufacturing a nanoimprinting substrate of claim 8, wherein
the layer to which the pattern from the mold is to be transferred is a thermosetting resin, and the steps for transferring the pattern from the mold comprise:
a step for pressing the mold at a temperature lower than the glass transition temperature of the thermosetting resin,
a step for heating the substrate on which the thermosetting resin is laminated to a temperature higher than the glass transition temperature of the thermosetting resin, and
a step for detaching the mold.

[claim11]
11. The method for manufacturing a nanoimprinting substrate of claim 8, wherein
the layer to which the pattern from the mold is to be transferred is formed by a solution containing a polymerizable monomer and a photopolymerization initiator, and the steps for transferring the pattern from the mold comprise:
a step for pressing the mold,
a step for cross-linking/curing the polymerizable monomer, and
a step for detaching the mold.

[claim12]
12. A composition comprising a nanoimprinting resin and a transfer-receiving resin to which a mold is to be transferred, wherein the nanoimprinting resin is represented by formula (1) below,
wherein in the formula, each of R1-R5 independently represents —H or —OH, with at least two of R1-R5 representing —OH being adjacent to each other, R6 represents a C1-20 linear, branched, or cyclic alkyl group, a C6-20 aryl group, or a C7-20 aralkyl group, X represents an amide or an ester, Y represents an amide or an ester, or may be absent, P represents an integer from 1 to 10, m and n are integers equal to or greater than 1, and
wherein when Y is an ester, R6 represents a C1-3 linear alkyl group, or a C5-20 linear alkyl group, or a C1-20 branched or cyclic alkyl group, or a C6-20 aryl group, or a C7-20 aralkyl group.

[claim13]
13. The composition of claim 12, wherein R6 of the nanoimprinting resin represents a C1-3 linear alkyl group or a C5-20 linear alkyl group, or a C1-20 branched or cyclic alkyl group, or a C6-20 aryl group, or a C7-20 aralkyl group.
  • 発明者/出願人(英語)
  • YABU HIROSHI
  • SAITO YULA
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
国際特許分類(IPC)
参考情報 (研究プロジェクト等) PRESTO Nanosystem and function emergence AREA
ライセンスをご希望の方、特許の内容に興味を持たれた方は、問合せボタンを押してください。

PAGE TOP

close
close
close
close
close
close