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IONIZATION METHOD, AND MASS-SPECTROSCOPIC METHOD AND APPARATUS UTILIZING THE IONIZATION METHOD

Foreign code F090002174
File No. F090002174
Posted date Mar 5, 2010
Country WIPO
International application number 2008JP071991
International publication number WO 2009/069816
Date of international filing Nov 27, 2008
Date of international publication Jun 4, 2009
Priority data
  • P2007-311322 (Nov 30, 2007) JP
Title IONIZATION METHOD, AND MASS-SPECTROSCOPIC METHOD AND APPARATUS UTILIZING THE IONIZATION METHOD
Abstract Provided is an ionizing method for ionizing the molecules of an extremely fine portion of a specimen. This ionizing method can image with a space resolving power of a nano-meter order. An object specimen (containing a specimen having a suitable matrix applied thinly thereto or mixed with the matrix) is exemplified by living tissues, cells, or organic materials. The specimen is applied to a substrate, and is evaporated on its surface with a thin film of gold of an nm order (or 10 nm, for example). The thin film of gold is irradiated with a double wave of a YAG laser of a wavelength of 532 nm so that it has a hole of an nm order. At the instant when the hole is formed, the thin gold film is further irradiated with the laser beam by lowering the beam output. The ions, which are generated from the holed region, are guided into a mass spectrometer so that they are subjected to a mass spectroscopy. By sweeping the specimen substrate or the laser beam, the molecule imaging image of the living specimen or the like can be formed in the nm order.
Scope of claims (In Japanese)
【請求項1】試料表面に金属の薄膜を形成し,上記金属によって選択的に吸収される波長のレーザ光を上記金属薄膜に照射して上記金属薄膜に穴をあけ,さらに上記穴を通してレーザ光を照射して上記穴のあいた箇所の上記試料の分子を脱離,イオン化する,イオン化方法。

【請求項2】上記金属薄膜に穴があくまではレーザ光の強度を穴があく程度に高く保ち,穴があいた後はレーザ光の強度を穴が拡大しない程度に下げる,請求の範囲第1項に記載のイオン化方法。

【請求項3】上記金属が金である,請求の範囲第1項または第2項に記載のイオン化方法。

【請求項4】上記レーザ光が可視光である,請求の範囲第1項から第3項のいずれか一項に記載のイオン化方法。

【請求項5】照射する上記レーザ光がパルス光である,請求の範囲第1項から第4項のいずれか一項に記載のイオン化方法。

【請求項6】上記レーザ光照射による試料分子の脱離,イオン化を真空中で行う,請求の範囲第1項から第5項のいずれか一項に記載のイオン化方法。

【請求項7】上記レーザ光の照射位置を相対的に走査して試料の異なる箇所の分子をイオン化する,請求の範囲第1項から第5項のいずれか一項に記載のイオン化方法。

【請求項8】請求の範囲第1項から第7項のいずれかのイオン化方法によりイオン化された分子を質量分析装置に導く,質量分析方法。

【請求項9】表面に金属薄膜が形成された試料を載置する試料台を内蔵する質量分析装置において,上記金属薄膜によって選択的に吸収される波長のレーザ光を上記試料台上の試料の表面に向けて集光して照射するレーザ光照射光学系と,レーザ光照射によって試料から脱離,イオン化する分子を質量分析空間に導くイオン導入手段とを備えたことを特徴とする質量分析装置。

【請求項10】上記試料台を三次元空間内の少なくとも一方向に変位させるマニュピレータをさらに備えている,請求の範囲第9項に記載の質量分析装置。
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • UNIVERSITY OF YAMANASHI
  • Inventor
  • HORI, Hirokazu
  • CHEN, Lee Chuin
  • HIRAOKA, Kenzo
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM(UTILITY MODEL),DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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