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DIHYDROXYHEXENOIC ACID ESTER AND METHOD FOR PRODUCING SAME meetings

Foreign code F100002258
Posted date Sep 28, 2010
Country WIPO
International application number 2010JP059889
International publication number WO 2010/143700
Date of international filing Jun 4, 2010
Date of international publication Dec 16, 2010
Priority data
  • P2009-138720 (Jun 9, 2009) JP
  • P2009-162840 (Jul 9, 2009) JP
  • P2009-162969 (Jul 9, 2009) JP
  • P2009-204883 (Sep 4, 2009) JP
Title DIHYDROXYHEXENOIC ACID ESTER AND METHOD FOR PRODUCING SAME meetings
Abstract Disclosed is a method whereby oseltamivir can be safely and stably produced in a large amount, via a dihydroxyhexenoic acid ester represented by formula (1), by using tartaric acid, mannitol or arabinose as a starting material. In formula (1), R1, R2 and R6 are the same or different and each represents an alkyl group, an aryl group, a substituted aryl group, an aralkyl group, a substituted aralkyl group or an aromatic heterocyclic group, provided that R1 and R2 do not represent methyl at the same time.
Scope of claims (In Japanese)
【請求項1】 式(1)で表される化合物。
(R1、R2、R6は同一又は相異してそれぞれアルキル基、アリール基、置換アリール基、アラルキル基、置換アラルキル基又は芳香族ヘテロ環基を示す。ただしR1、R2は同時にメチルではない。)

【請求項2】 式(2)で表される化合物。
(R1、R2、R6は請求項1に同じ。Dは水素又は水酸基の保護基である。)

【請求項3】 式(3)で表される化合物。
(R1、R2、R6は請求項1と同じであり、Dは請求項2と同じ。Raはアルキル基、アリール基、置換アリール基、アラルキル基、置換アラルキル基又は芳香族ヘテロ環基を示す。)

【請求項4】 式(4)で表される化合物。
(R1、R2は請求項1と同じであり、Dは請求項2と同じ。R5はアルキル基、アリール基、置換アリール基、アラルキル基、置換アラルキル基又は芳香族ヘテロ環基を示す。)

【請求項5】 式(5)で表される化合物。
(R1、R2は請求項1と同じであり、R5は請求項4に同じ。)

【請求項6】 式(6)で表される化合物。
(R1、R2、R6は請求項1に同じ。)

【請求項7】 式(7)で表される化合物。
(R1、R2、R6は請求項1に同じ。)

【請求項8】 式(8)で表される化合物。
(R1、R2、R6は請求項1に同じ。)

【請求項9】 式(9)で表される化合物。
(R1、R2、R6は請求項1に同じ。Raは請求項3に同じ。)

【請求項10】 式(10)で表される化合物。
(R1、R2は請求項1に同じ。)

【請求項11】 式(11)で表される化合物。
(R1、R2は請求項1に同じ。)

【請求項12】 式(12)で表される化合物。
(R1、R2、R6は請求項1に同じ。Raは請求項3に同じ。)

【請求項13】 式(13)で表される化合物。
(R1、R2は請求項1に同じ。)

【請求項14】 式(14)で表される化合物。
(R1、R2は請求項1に同じ。)
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • NATIONAL UNIVERSITY CORPORATION OKAYAMA UNIVERSITY
  • Inventor
  • ISHIKAWA, Teruhiko
  • SAITO, Seiki
  • KUDOH, Takayuki
  • SUDO, Koutaro
  • NISHIUCHI, Hironori
  • OKADA, Makoto
  • TANIGUCHI, Masatoshi
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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