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WATER-SOLUBLE PORPHYRIN AND PROCESS FOR PRODUCTION THEREOF meetings

Foreign code F110002356
File No. E-082
Posted date Jan 6, 2011
Country WIPO
International application number 2010JP067530
International publication number WO 2011/043369
Date of international filing Oct 6, 2010
Date of international publication Apr 14, 2011
Priority data
  • P2009-233246 (Oct 7, 2009) JP
Title WATER-SOLUBLE PORPHYRIN AND PROCESS FOR PRODUCTION THEREOF meetings
Abstract Disclosed is a porphyrin derivative having improved water solubility, desirably having both water solubility and fat solubility. Specifically disclosed is a water-soluble porphyrin comprising a tetraphenylporphyrin derivative represented by general formula (1) [wherein m represents an integer of 1 to 30; n represents an integer of 2 to 4; R represents a hydrogen atom, or an alkyl or aromatic group which may have a substituent; Ph represents a phenyl group which may have a substituent; and X- is a counter ion and represents a halide ion, PF6- or BF4-].
Scope of claims (In Japanese)
【請求項1】 下記一般式(1)
【化学式1】〔式中、mは1~30の整数、nは2~4の整数を示す。Rは水素原子、又は置換基を有してもよいアルキル基もしくは芳香族基を示す。Phは置換基を有してもよいフェニル基を示す。X-は対イオンであり、ハロゲン化物イオン、PF6 -又はBF4 -を示す。〕
で示されるテトラフェニルポルフィリン誘導体からなる水溶性ポルフィリン。

【請求項2】 前記mは、1~9の整数である、請求項1に記載の水溶性ポルフィリン。

【請求項3】 前記nは、2~3の整数である、請求項1又は2に記載の水溶性ポルフィリン。

【請求項4】 前記Rは、メチル基、エチル基、ブチル基、ヘキシル基、ドデシル基又はオクタデシル基である、請求項1~3のいずれかに記載の水溶性ポルフィリン。

【請求項5】 中心金属としてリンを含有するテトラフェニルポルフィリンリン錯体を原料とし、当該錯体に、軸配位子として、下記一般式(2)
 -O-(CnH2nO)m-R  (2)
〔式中、mは1~30の整数、nは2~4の整数を示す。Rは水素原子、又は置換基を有してもよいアルキル基もしくは芳香族基を示す。〕
で示されるポリアルキレングリコール部位及び置換基(R)を有する配位子を導入する、請求項1に記載の水溶性ポルフィリンの製造方法。

【請求項6】 光力学的療法における光増感剤として用いる、請求項1~4のいずれかに記載の水溶性ポルフィリン。
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • UNIVERSITY OF MIYAZAKI
  • Inventor
  • YASUDA, Masahide
  • SHIRAGAMI, Tsutomu
  • MATSUMOTO, Jin
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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