Top > Search of International Patents > ANTIREFLECTION STRUCTURE, PROCESS FOR PRODUCING THE SAME AND PROCESS FOR PRODUCING OPTICAL MEMBER

ANTIREFLECTION STRUCTURE, PROCESS FOR PRODUCING THE SAME AND PROCESS FOR PRODUCING OPTICAL MEMBER

Foreign code F110002502
File No. S2008-0576-N0
Posted date Mar 14, 2011
Country WIPO
International application number 2007JP065667
International publication number WO 2008/018570
Date of international filing Aug 9, 2007
Date of international publication Feb 14, 2008
Priority data
  • P2006-217577 (Aug 9, 2006) JP
  • P2007-039340 (Feb 20, 2007) JP
Title ANTIREFLECTION STRUCTURE, PROCESS FOR PRODUCING THE SAME AND PROCESS FOR PRODUCING OPTICAL MEMBER
Abstract An antireflection structure having a base material of glassy carbon, characterized in that the base material at its surface is provided with an antireflection conformation composed of a cluster of minute projections each with a configuration tapering toward the apical end thereof. Preferably, the minute projections each have an average height of 200 to 3000 nm and an average maximum diameter of 50 to 300 nm and are provided with an average pitch of 50 to 300 nm. The provided antireflection structure can be easily produced and can exert an antireflection effect close to nonreflection. Further, even a material of high melting point, such as silica glass, can be provided with the minute conformation by transfer to thereby obtain the antireflection structure.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • TOKYO UNIVERSITY OF SCIENCE EDUCATIONAL FOUNDATION ADMINISTRATIVE ORGANIZATION
  • Inventor
  • TANIGUCHI, Jun
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH,BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO,DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH,GM,GT,HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM,PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,SV,SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN,ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HU,IE,IS,IT,LT,LU,LV,MC,MT,NL,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW,GH,GM,KE,LS,MW,MZ,NA,SD,SL,SZ,TZ,UG,ZM,ZW),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
Please contact us by E-mail or facsimile if you have any interests on this patent.

PAGE TOP

close
close
close
close
close
close