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SOLUTION CONCENTRATION DISTRIBUTION MEASURING DEVICE meetings

Foreign code F110002664
File No. S2008-0024-C0
Posted date Apr 6, 2011
Country WIPO
International application number 2008JP068478
International publication number WO 2009/051080
Date of international filing Oct 10, 2008
Date of international publication Apr 23, 2009
Priority data
  • P2007-268413 (Oct 15, 2007) JP
Title SOLUTION CONCENTRATION DISTRIBUTION MEASURING DEVICE meetings
Abstract [PROBLEMS] To provide a device for detecting a reaction distribution or a concentration distribution of a material present within a microflow passage for a solution chemical reaction. [MEANS FOR SOLVING PROBLEMS] A material distribution measuring device (1) for measuring a reaction distribution or a concentration distribution of a material contained in a solution. The material distribution measuring device (1) comprises a material detecting plate (5) comprising a material-sensitive film (21) provided on an insulator (22) provided on a semiconductor (23), a flow passage forming part (6) forming a solution flow passage (12) on the material detecting plate (5), means for stabilizing the potential of the solution, means for applying a pulsed laser beam (9) from the semiconductor (23) side to the flow passage (12) side, means for scanning the material detecting plate (5) two-dimensionally with use of the pulsed laser beam (9), means for measuring the amplitude strength of pulsed electromagnetic waves generated upon the application of the pulsed laser beam (9) to the material detecting plate (5), and means for obtaining a reaction distribution or a concentration distribution of the material contained in the solution within the flow passage by qualitatively or quantitatively measuring the material to be detected from the amplitude strength. The material-sensitive film (21) constitutes a part of the inner wall surface of the flow passage (12).
Scope of claims (In Japanese)
【請求項1】 溶液中の物質の反応分布もしくは濃度分布を計測する溶液濃度分布計測装置であって、
 絶縁体と、
 該絶縁体の一端面に当接され、所定の厚さを有する半導体と、
 前記絶縁体の他端面に当接される物質感応膜と、
 を有する物質検出プレートと、
 該物質検出プレート上に溶液の流路を形成する流路形成部と、
 前記溶液の電位を安定させる手段と、
 前記半導体側から前記流路側にフェムト秒レーザー光を照射する手段と、
 前記フェムト秒レーザー光を前記物質検出プレートに対して2次元的に走査させる手段と、
 該2次元的に走査させる手段により、前記フェムト秒レーザー光を前記物質検出プレートに照射することで発生するパルス電磁波の振幅強度を直接計測する手段と、
 前記振幅強度より、被検出物質を定量的、かつ、連続的に計測して前記流路内の溶液中の物質の反応分布もしくは濃度分布を二次元マッピングとして得る手段と、を備え、
 前記物質感応膜が前記流路の内壁面の一部を構成したことを特徴とする溶液濃度分布計測装置。

【請求項2】 前記半導体の所定の厚さは、
 前記半導体の光吸収係数の逆数である光侵入長と同等の厚さであることを特徴とする請求項1に記載の溶液濃度分布計測装置。

【請求項3】 前記半導体の所定の厚さは、
 前記半導体の厚さに対する前記パルス電磁波の振幅強度と、前記半導体の厚さに対する前記反応分布もしくは前記濃度分布の空間分解能の積との関係に基づいて決定される半導体の厚さ領域内であることを特徴とする請求項1に記載の溶液濃度分布計測装置。

【請求項4】 前記決定される半導体の厚さ領域内は、
 前記半導体の厚さに対する前記パルス電磁波の振幅強度と、前記半導体の厚さに対する前記反応分布もしくは前記濃度分布の空間分解能との積の関係を表す曲線において現れる第一変曲点から第二変曲点までに対応する半導体の厚さ領域内であることを特徴とする請求項3に記載の溶液濃度分布計測装置。
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • National University Corporation Okayama University
  • Inventor
  • KIWA, Toshihiko
  • TSUKADA, Keiji
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM(UTILITY MODEL),DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME(PETTY PATENT),MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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