Top > Search of International Patents > METHOD OF MEASURING ELECTRICAL RESISTANCE VALUE OF CORNEAL TRANS-EPITHELIUM

METHOD OF MEASURING ELECTRICAL RESISTANCE VALUE OF CORNEAL TRANS-EPITHELIUM

Foreign code F110002735
File No. S2009-1113-N0
Posted date Apr 11, 2011
Country WIPO
International application number 2009JP053968
International publication number WO 2009/110470
Date of international filing Mar 3, 2009
Date of international publication Sep 11, 2009
Priority data
  • P2008-052567 (Mar 3, 2008) JP
Title METHOD OF MEASURING ELECTRICAL RESISTANCE VALUE OF CORNEAL TRANS-EPITHELIUM
Abstract This object aims to provide a method in which evaluating a corneal disorder can be quantitatively measured and the corneal disorder applicable to living eyes can be evaluated. This method of measuring an electrical resistance of a cornea trans-epithelium is characterized in that electrodes are disposed on a cornea and a conjunctiva, respectively. The method comprises: (1) a step of disposing a first electrode on the cornea and a second electrode on the conjunctiva, and (2) a step of measuring the electrical resistance by flowing a current between the first electrode and the second electrode. Furthermore, a device for measuring an electricalresistance of a corneal trans-epithelium is provided.
Scope of claims (In Japanese)
【請求項1】 電極を、角膜上および結膜上に配置することを特徴とする、角膜経上皮電気抵抗の測定方法。

【請求項2】 角膜経上皮電気抵抗を測定する方法であって、
(1)第一の電極を角膜上に配置し、第二の電極を結膜上に配置する工程;および
(2)第一の電極と第二の電極との間に電流を流し、電気抵抗を測定する工程
を含む、方法。

【請求項3】 角膜上に配置した電極の周囲が絶縁されている、請求項1または2記載の方法。

【請求項4】 生体眼で実施する、請求項1~3のいずれか一項に記載の方法。

【請求項5】 生体眼の角膜経上皮電気抵抗を測定するための装置であって、
(1)角膜上に配置するのに適した第一の電極、
(2)結膜上に配置するのに適した第二の電極、および
(3)第一の電極を絶縁する絶縁体、
を備え、かつ第一の電極と絶縁体とが一体化されている、装置。

【請求項6】 第一の電極と絶縁体とが、電導体を介して一体化されている、請求項5記載の装置。

【請求項7】 さらに第二の電極が一体化されている、請求項5または6に記載の装置。

【請求項8】 絶縁体がシリコンゴムで形成され、且つ絶縁体の角膜との接触面が角膜と同じ曲率を有している、請求項5~7のいずれか1項記載の装置。

【請求項9】 第二の電極がシート状の形態である、請求項5~8のいずれか1項記載の装置。

【請求項10】 電導体がヒアルロン酸又はアテロコラーゲンのゲルである、請求項5~9のいずれか1項記載の装置。
 
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • NAGASAKI UNIVERSITY
  • TOHOKU UNIVERSITY
  • Inventor
  • UEMATSU, Masafumi
  • KITAOKA, Takashi
  • NISHIDA, Koji
  • TANAKA, Yuji
  • NISHIZAWA, Matsuhiko
  • KAJI, Hirokazu
  • SEKINE, Soichiro
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM(UTILITY MODEL),DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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