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Carbon-based fine structure group, aggregate of carbon based fine structures, use thereof and method for preparation thereof

外国特許コード F110004133
整理番号 RX03P22WO
掲載日 2011年7月11日
出願国 欧州特許庁(EPO)
出願番号 05734218
公報番号 1777195
出願日 平成17年4月19日(2005.4.19)
公報発行日 平成19年4月25日(2007.4.25)
国際出願番号 JP2005007480
国際公開番号 WO2005102924
国際出願日 平成17年4月19日(2005.4.19)
国際公開日 平成17年11月3日(2005.11.3)
優先権データ
  • 特願2004-123476 (2004.4.19) JP
  • 2005WO-JP07480 (2005.4.19) WO
発明の名称 (英語) Carbon-based fine structure group, aggregate of carbon based fine structures, use thereof and method for preparation thereof
発明の概要(英語) (EP1777195)
An aggregate of carbon-based fine structures in which a plurality of carbon-based fine structures are collected, wherein respective carbon-based fine structures are oriented in the same direction.
The above aggregate of carbon-based fine structures is an aggregate of a plurality of carbon-based fine structures in a state they are pulled by one another with strong interaction, and has such a length that allows the improvement of the handeability and workability thereof.
特許請求の範囲(英語) [claim1]
1. An aggregate of carbon-based microstructures, which comprises a plurality of carbon-based microstructures that are assembled together,
wherein the carbon-based microstructures are aligned in one direction, and are assembled together along the direction of alignment.
[claim2]
2. An aggregate of carbon-based microstructures as set forth in claim 1, wherein the carbon-based microstructures are assembled together in a direction orthogonal to the direction of alignment.
[claim3]
3. An aggregate of carbon-based microstructures as set forth in claim 1 or 2, wherein the carbon-based microstructures are bonded together by van der Waals forces.
[claim4]
4. An aggregate of carbon-based microstructures as set forth in claim 1 or 2, wherein the carbon-based microstructures are physically or chemically bonded together.
[claim5]
5. An aggregate of carbon-based microstructures as set forth in any one of claims 1 through 4, wherein the carbon-based microstructures include no greater than 10 bends per 1 micron m length extending in the direction of alignment.
[claim6]
6. An aggregate of carbon-based microstructures as set forth in any one of claims 1 through 5, wherein the carbon-based microstructures are carbon nanotubes.
[claim7]
7. An aggregate of carbon-based microstructures as set forth in any one of claims 1 through 5, wherein metal is supported on the carbon-based microstructures.
[claim8]
8. An aggregate of carbon-based microstructures as set forth in any one of claims 1 through 5, wherein the carbon-based microstructures are surface-modified.
[claim9]
9. An aggregate of carbon-based microstructures as set forth in any one of claims 1 through 8, wherein the carbon-based microstructures are used for a reinforcing material, an electrical wire, a conducting wire, a sensor, a transparent conductor, a blade, a motor, a building material, a diaphragm, a sliding member, an artificial muscle, clothes, a fishing line, a photo-absorber, a reflector, a nonwoven fabric, an artificial dielectric medium, ink, coatings, a heat-resistant material, or an abrasion-resistant material.
[claim10]
10. A plied yarn-structure which comprises a ply of a plurality of aggregates set forth in any one of claims 1 through 8.
[claim11]
11. A fabric structure which comprises a resin-impregnated ply of a plurality of aggregates set forth in any one of claims 1 through 6.
[claim12]
12. A coiled structure which comprises a roll of an aggregate set forth in any one of claims 1 through 6.
[claim13]
13. A resin sheet that comprises an aggregate of carbon-based microstructures set forth in any one of claims 1 through 6.
[claim14]
14. A laminate that comprises one or more of the resin sheet set forth in claim 13.
[claim15]
15. A high-temperature conducting sheet which comprises the resin sheet of claim 13 or the laminate of claim 14.
[claim16]
16. A film which comprises an aggregate of carbon-based microstructures set forth in any one of claims 1 through 6.
[claim17]
17. A film as set forth in claim 16, which is used as a transparent electromagnetic wave absorber.
[claim18]
18. An array of carbon-based microstructures, which comprises carbon-based microstructures that are provided on a substrate by being aligned substantially perpendicular to the substrate,
wherein the carbon-based microstructures are provided on the substrate at a density of no less than 1 x 10 **11/cm **2.
[claim19]
19. An array of carbon-based microstructures as set forth in claim 18, wherein the carbon-based microstructures include no greater than 10 bends per 1 micron m length extending in the direction of alignment.
[claim20]
20. An aggregate of carbon-based microstructures, which comprises carbon-based microstructures obtained by pulling at least one of the carbon-based microstructures of the array of carbon-based microstructures set forth in claim 18 or 19.
[claim21]
21. A fabrication method of an aggregate of carbon-based microstructures, comprising the steps of: forming a plurality of carbon-based microstructures on a substrate with a direction of alignment perpendicular to the substrate;
and pulling at least one of the carbon-based microstructures.
[claim22]
22. A fabrication method as set forth in claim 21, further comprising the step of splitting the substrate, before the pulling step.
[claim23]
23. A fabrication method as set forth in claim 21 or 22,
wherein the forming step is performed by supplying the substrate with a source gas for forming the carbon-based microstructures, and a carrier gas for carrying the source gas, and
wherein a proportion of concentration of the source gas with respect to a total concentration of the all gases is no less than 23%.
[claim24]
24. A producing method as set forth in any one of claims 21 through 23, further comprising the step of physically or chemically bonding the carbon-based microstructures together.
  • 出願人(英語)
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • NISSHIN ELECTRIC
  • OSAKA PREFECTURE
  • OTSUKA CHEMICAL
  • OSAKA PREFECTURE UNIVERSITY
  • TAIYO NIPPON SANSO
  • 発明者(英語)
  • NAKAYAMA YOSHIKAZU
  • NOSAKA TOSHIKAZU
  • SUEKANE OSAMU
  • NAGASAKA TAKESHI
  • GOTO TOSHIKI
  • TSUCHIYA HIROYUKI
  • SHIONO KEISUKE
国際特許分類(IPC)
指定国 (EP1777195)
Contracting States: DE FR GB
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