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SURFACE ANESTHETIC AGENT

Foreign code F110005356
File No. S2009-0892-C0
Posted date Sep 2, 2011
Country WIPO
International application number 2010JP004312
International publication number WO 2011/001676
Date of international filing Jun 30, 2010
Date of international publication Jan 6, 2011
Priority data
  • P2009-157425 (Jul 2, 2009) JP
Title SURFACE ANESTHETIC AGENT
Abstract Disclosed is an anesthetic agent which can exhibit an anesthetic effect rapidly when adhered on mucosal membranes, the skin or the like by means of application or the like for regional anesthesia, particularly surface anesthesia. Specifically disclosed are: a fast-acting surface anesthetic agent comprising lidocaine and ethyl paraaminobenzoate at a specified ratio; and a super fast-acting surface anesthetic agent comprising lidocaine, ethyl paraaminobenzoate and adrenaline at a specified ratio.
Scope of claims (In Japanese)
【請求項1】リドカインとパラアミノ安息香酸エチルとを質量比1:99~47:53の割合で含むことを特徴とする表面麻酔剤。

【請求項2】リドカインとパラアミノ安息香酸エチルとを質量比6:94~18:82の割合で含むことを特徴とする請求項1記載の表面麻酔剤。

【請求項3】リドカインとパラアミノ安息香酸エチルに、さらにアドレナリンを含むことを特徴とする請求項1又は2記載の表面麻酔剤。

【請求項4】リドカインとパラアミノ安息香酸エチルとの合計100質量部に対して、アドレナリンを0.1~0.001質量部を含むことを特徴とする請求項1~3のいずれか記載の表面麻酔剤。

【請求項5】リドカインとパラアミノ安息香酸エチルとを質量比1:99~47:53の割合で含む組成物を表面麻酔剤製造のために使用する方法。

【請求項6】組成物が、リドカインとパラアミノ安息香酸エチルとを質量比6:94~18:82の割合で含むことを特徴とする請求項5記載の方法。

【請求項7】組成物が、リドカインとパラアミノ安息香酸エチルに、さらにアドレナリンを含むことを特徴とする請求項5又は6記載の方法。

【請求項8】組成物が、リドカインとパラアミノ安息香酸エチルとの合計100質量部に対して、アドレナリンを0.001~0.1質量部を含むことを特徴とする請求項5~7のいずれか記載の方法。
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • YAMAGUCHI UNIVERSITY
  • Inventor
  • HARADA, Koji
  • ITASHIKI, Yasutaka
  • HARADA, Toyoko
  • UEYAMA, Yoshiya
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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