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Spin transistor based on the spin-filter effect, and non-volatile memory using spin transistors

外国特許コード F110005377
整理番号 K02003US3
掲載日 2011年9月5日
出願国 アメリカ合衆国
出願番号 97922007
公報番号 20080067501
公報番号 7825485
出願日 平成19年10月31日(2007.10.31)
公報発行日 平成20年3月20日(2008.3.20)
公報発行日 平成22年11月2日(2010.11.2)
国際出願番号 JP2003009438
国際公開番号 WO2004012272
国際出願日 平成15年7月25日(2003.7.25)
国際公開日 平成16年2月5日(2004.2.5)
優先権データ
  • 特願2002-217336 (2002.7.25) JP
  • 特願2003-086145 (2003.3.26) JP
  • 2003WO-JP09438 (2003.7.25) WO
  • 2005US-10522241 (2005.10.5) US
発明の名称 (英語) Spin transistor based on the spin-filter effect, and non-volatile memory using spin transistors
発明の概要(英語) (US7825485)
A spin transistor comprises a spin injector for injecting, from a first nonmagnetic electrode carriers with a spin parallel to a spin band forming the band edge of a first ferromagnetic barrier layer, to a second nonmagnetic electrode layer, as hot carriers.
It also comprises a spin analyzer whereby, due to spin-splitting at the band edge of a second ferromagnetic barrier layer, the spin-polarized hot carriers are transported to a third nonmagnetic electrode when the direction of the spin of the carriers injected into the second nonmagnetic electrode is parallel to that of the spin of the spin band at the band edge of the second ferromagnetic barrier layer, whereas the hot carriers are not transported to the third nonmagnetic electrode in the case of antiparallel spin.
A memory element is also provided that comprises such a spin transistor.
特許請求の範囲(英語) [claim1]
1. A transistor comprising a tunnel junction structure and a gate electrode, wherein said tunnel junction structure comprises: a tunnel barrier formed of an insulating nonmagnetic material;
a source formed of a ferromagnetic material; and
a drain formed of a ferromagnetic material, said tunnel barrier being disposed between said source and said drain, the source being joined to one end surface of said tunnel barrier and the drain being joined to the other end surface of said tunnel barrier,
wherein said gate electrode is formed over said tunnel barrier and configured to apply an electric field to the tunnel barrier, and
wherein the tunnel barrier is formed with a thickness such that Fowler-Nordheim tunneling does not occur when the gate electrode is not applying the electric field to the tunnel barrier and Fowler-Nordheim tunneling does occur when the gate electrode is applying the electric field to the tunnel barrier.
[claim2]
2. The transistor according to claim 1, wherein the ferromagnetic material used in said source and said drain is a ferromagnetic metal or a ferromagnetic semiconductor.
[claim3]
3. The transistor according to claim 1, wherein a thickness of said tunnel barrier is set to be such that a tunnel current can take place from said source to said drain with the application of a voltage to said gate electrode.
[claim4]
4. The transistor according to claim 1, wherein a magnitude of mutual conductance or an output current is controlled by relative magnetization directions of said source and said drain.
[claim5]
5. The transistor according to claim 1, wherein one of said source and said drain has a coercivity that is higher than that of the other of said source and said drain.
[claim6]
6. A transistor comprising a tunnel junction structure and a gate electrode, wherein said tunnel junction structure comprises: a tunnel barrier famed of an insulating nonmagnetic material;
a source formed of a ferromagnetic material; and
a drain formed of a ferromagnetic material, said tunnel barrier being disposed between said source and said drain, said source being joined to a first end surface of said tunnel barrier, said drain being joined to a second end surface of said tunnel barrier,
wherein said gate electrode is formed on said tunnel barrier and applies an electric field to the tunnel barrier, and
wherein the tunnel barrier has a thickness and an energy band edge that enables a carrier to pass through the tunnel barrier via Fowler-Nordheim tunneling from the source to the drain.
  • 発明者/出願人(英語)
  • SUGAHARA SATOSHI
  • TANAKA MASAAKI
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
国際特許分類(IPC)
参考情報 (研究プロジェクト等) PRESTO Nanostructure and Material Property AREA
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