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Composite material, method of producing the same, and apparatus for producing the same achieved

Foreign code F110005545
File No. N072-17WO
Posted date Sep 7, 2011
Country United States of America
Application number 92134809
Gazette No. 20110117373
Gazette No. 8722196
Date of filing Mar 2, 2009
Gazette Date May 19, 2011
Gazette Date May 13, 2014
International application number JP2009053877
International publication number WO2009110431
Date of international filing Mar 2, 2009
Date of international publication Sep 11, 2009
Priority data
  • P2008-057865 (Mar 7, 2008) JP
  • P2008-211238 (Aug 19, 2008) JP
  • 2009WO-JP53877 (Mar 2, 2009) WO
Title Composite material, method of producing the same, and apparatus for producing the same achieved
Abstract (US8722196)
Proposed are a composite material having a high adhesiveness, wherein non-penetrating pores that are formed in a silicone surface layer are filled up with a metal or the like without leaving any voids by using the plating technique and the silicone surface layer is coated with the metal or the like, and a method of producing the composite material.
A composite material, which has a high adhesiveness between a second metal or an alloy of the second metal (106a, 106b) and a silicone surface, can be obtained by filling up non-penetrating pores that are formed in the surface of a silicone substrate (100) substantially with a second metal or an alloy of the second metal (106a) with the use of the autocatalytic electroless plating technique wherein a first metal located at the bottom of the non-penetrating pores as described above serves as the starting point, and coating the surface of the silicone substrate (100) with the second metal (106b).
Scope of claims [claim1]
1. A composite material having non-penetrating pores in a silicon surface, wherein: the non-penetrating pores have a maximum depth of 180 nm;
a first metal is located at bottoms of the non-penetrating pores;
a second metal, or an alloy thereof, substantially fills the remaining volume of the non-penetrating pores;
the silicon surface is covered with the second metal or alloy thereof; and
the second metal is adhered to the silicon surface with an adhesibility such that the second metal cannot be detached from the silicon surface when tested according to Japanese Industrial Standard test H8504.
[claim2]
2. The composite material of claim 1, wherein: the non-penetrating pores are formed in the silicon surface by immersing the silicon surface in a solution comprising fluoride ions, the silicon surface having the first metal dispersed thereon in the shapes of particles, islands, or films.
[claim3]
3. The composite material of claim 1, wherein: the silicon surface is porous by provision of the non-penetrating pores.
[claim4]
4. The composite material of any one of claims 1 to 3, wherein: the first metal comprises at least one metal selected from palladium (Pd), silver (Ag), gold (Au), platinum (Pt), and rhodium (Rh).
[claim5]
5. The composite material of claim 1, wherein: the silicon comprises a material selected from single-crystalline silicon, polycrystalline silicon, microcrystalline silicon and amorphous silicon.
[claim6]
6. The composite material of claim 1, wherein the second metal is adhered to the silicon surface with an adhesibility of greater than 426 J/m2.
[claim7]
7. The composite material of claim 1, wherein the second metal adheres to the silicon surface with an adhesibility of greater than 1317 J/m2.
[claim8]
8. The composite material of claim 1, wherein the non-penetrating pores have a maximum depth of 170 nm.
[claim9]
9. The composite material of claim 1, wherein the non-penetrating pores have a maximum depth of 120 nm.
[claim10]
10. A composite material having non-penetrating pores in a silicon surface, wherein: the non-penetrating pores have a maximum depth of 180 nm;
a first metal is located at bottoms of the non-penetrating pores;
a second metal, or an alloy thereof, substantially fills the remaining volume of the non-penetrating pores;
the silicon surface is covered with the second metal or alloy thereof; and
the second metal is adhered to the silicon surface with an adhesibility of greater than 426 J/m2.
[claim11]
11. The composite material of claim 10, wherein the second metal adheres to the silicon surface with an adhesibility of greater than 1317 J/m2.
[claim12]
12. The composite material of claim 10, wherein the non-penetrating pores have a maximum depth of 170 nm.
[claim13]
13. The composite material of claim 10, wherein the non-penetrating pores have a maximum depth of 120 nm.
[claim14]
14. The composite material of claim 10, wherein: the non-penetrating pores are formed in the silicon surface by immersing the silicon surface in a solution comprising fluoride ions, the silicon surface having the first metal dispersed thereon in the shapes of particles, islands, or films.
[claim15]
15. The composite material of claim 10, wherein: the silicon surface is porous by provision of the non-penetrating pores.
[claim16]
16. The composite material of claim 10, wherein: the first metal comprises at least one metal selected from palladium (Pd), silver (Ag), gold (Au), platinum (Pt), and rhodium (Rh).
[claim17]
17. The composite material of claim 10, wherein: the silicon comprises a material selected from single-crystalline silicon, polycrystalline silicon, microcrystalline silicon and amorphous silicon.
  • Inventor, and Inventor/Applicant
  • YAE SHINJI
  • HIRANO TATSUYA
  • MATSUDA HITOSHI
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
IPC(International Patent Classification)
Reference ( R and D project ) CREST Development of Advanced Nanostructured Materials for Energy Conversion and Storage AREA
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