Top > Search of International Patents > DEVICE FOR CRYSTALLIZING BIOPOLYMER, CELL OF SOLUTION FOR CRYSTALLIZING BIOPOLYMER, METHOD FOR CONTROLLING ALIGNMENT OF BIOPOLYMER, METHOD FOR CRYSTALLIZING BIOPOLYMER AND BIOPOLYMER CRYSTAL

DEVICE FOR CRYSTALLIZING BIOPOLYMER, CELL OF SOLUTION FOR CRYSTALLIZING BIOPOLYMER, METHOD FOR CONTROLLING ALIGNMENT OF BIOPOLYMER, METHOD FOR CRYSTALLIZING BIOPOLYMER AND BIOPOLYMER CRYSTAL

Foreign code F110005803
File No. S2009-0255-C0
Posted date Oct 11, 2011
Country WIPO
International application number 2010JP001044
International publication number WO 2010/100847
Date of international filing Feb 18, 2010
Date of international publication Sep 10, 2010
Priority data
  • P2009-049043 (Mar 3, 2009) JP
Title DEVICE FOR CRYSTALLIZING BIOPOLYMER, CELL OF SOLUTION FOR CRYSTALLIZING BIOPOLYMER, METHOD FOR CONTROLLING ALIGNMENT OF BIOPOLYMER, METHOD FOR CRYSTALLIZING BIOPOLYMER AND BIOPOLYMER CRYSTAL
Abstract Provided is a device for crystallizing a biopolymer by which biopolymer crystals can be efficiently formed by applying a low voltage to a minute amount of a solution of the biopolymer to be crystallized and the state of the formation of the crystals can be observed without interference by electrodes. As electrodes for applying an electric field to a biopolymer solution, transparent electrodes, which do not interfere the formation of crystals, are used. Between electrodes (2) comprising a transparent conductor, an electrical insulating member (4) is positioned and a minute amount of a solution (1) of a biopolymer to be crystallized is held between the electrodes. By applying a low voltage supplied from a voltage generator (5) to the transparent electrodes (2), the biopolymer is efficiently crystallized. The state of the formation of the biopolymer crystals can be optically observed from the electrode side of the transparent conductor. Due to the electrical field formed by the voltage application, the alignment of the biopolymer can be controlled.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • Institute of National Colleges of Technology, Japan
  • Inventor
  • WAKAMATSU, Takashi
  • OHNISHI, Yuki
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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