Top > Search of International Patents > METHOD FOR PRODUCING STEREO COMPLEX CRYSTALS OF POLYLACTIC ACID, POLYLACTIC ACID, AND MOLDED BODY, SYNTHETIC FIBER, POROUS BODY AND ION CONDUCTOR COMPRISING SAME

METHOD FOR PRODUCING STEREO COMPLEX CRYSTALS OF POLYLACTIC ACID, POLYLACTIC ACID, AND MOLDED BODY, SYNTHETIC FIBER, POROUS BODY AND ION CONDUCTOR COMPRISING SAME

Foreign code F110005883
File No. S2009-1062-C0
Posted date Nov 9, 2011
Country WIPO
International application number 2010JP065348
International publication number WO 2011/030766
Date of international filing Sep 7, 2010
Date of international publication Mar 17, 2011
Priority data
  • P2009-209413 (Sep 10, 2009) JP
Title METHOD FOR PRODUCING STEREO COMPLEX CRYSTALS OF POLYLACTIC ACID, POLYLACTIC ACID, AND MOLDED BODY, SYNTHETIC FIBER, POROUS BODY AND ION CONDUCTOR COMPRISING SAME
Abstract Disclosed are: a method for producing stereo complex crystals of polylactic acid whereby polylactic acid having excellent heat resistance and containing stereo complex crystals at a high ratio can be efficiently produced; the thus obtained polylactic acid that contains stereo complex crystals at a high ratio and has excellent heat resistance; and a molded body, a synthetic fiber, a porous body and an ion conductor each having excellent heat resistance. Specifically disclosed is a method for producing stereo complex crystals of polylactic acid, comprising: a step for dissolving in a solvent a block copolymer, which comprises polylactic acid containing an L-lactic acid unit or polylactic acid containing a D-lactic acid unit together with at least one kind of an organic polymer having a different structure from polylactic acid, and a polylactic acid homopolymer containing a D-lactic acid unit or a polylactic acid homopolymer containing an L-lactic acid unit, said lactic acid unit being an optical isomer that is not contained in the aforesaid block copolymer, to give a polymer mixture solution; and a step for removing the solvent from the polymer mixture solution.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY
  • Inventor
  • UEHARA, Hiroki
  • YAMANOBE, Takeshi
  • KARAKI, Yusuke
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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