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MANUFACTURING METHOD AND DEVICE FOR COMPOSITION IN WHICH DISPERSED PHASE IS FINELY DISPERSED INTO CONTINUOUS PHASE meetings

Foreign code F110005935
File No. QP080213-PC
Posted date Nov 28, 2011
Country WIPO
International application number 2010JP071658
International publication number WO 2011/068191
Date of international filing Dec 3, 2010
Date of international publication Jun 9, 2011
Priority data
  • P2009-276136 (Dec 4, 2009) JP
Title MANUFACTURING METHOD AND DEVICE FOR COMPOSITION IN WHICH DISPERSED PHASE IS FINELY DISPERSED INTO CONTINUOUS PHASE meetings
Abstract Disclosed is a method whereby a composition in which a dispersed phase is finely dispersed in a continuous phase with low polydispersity can be produced with excellent production efficiency. The composition is manufactured using a manufacturing process comprising the following steps: (A) a swirl flow of a continuous phase liquid is passed through a cylinder configured so that a part or all of the peripheral surface is a porous membrane; (B1) a dispersed phase liquid is supplied to the swirl flow via the porous membrane and dispersed phase particles are formed on the porous membrane; and (B2) the dispersed phase particles formed on the porous membrane are detached by the shear force of the swirl flow. The cylinder has an inflow port for the continuous phase liquid on the peripheral surface near one end of the cylinder and an inlet tube which extends from the inflow port in a direction that is substantially perpendicular to the axis of the cylinder and tangential to the cylinder. It is preferable for step (A) to be configured so that the continuous phase liquid is made to flow in to the cylinder from a direction that is substantially perpendicular to the axis of the cylinder and tangential to the inner wall of the cylinder by means of the inlet tube.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
  • Inventor
  • SHIMODA, Mitsuya
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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