Top > Search of International Patents > HIGH-FREQUENCY ACCELERATOR, METHOD FOR MANUFACTURING HIGH-FREQUENCY ACCELERATOR, QUADRUPOLE ACCELERATOR, AND METHOD FOR MANUFACTURING QUADRUPOLE ACCELERATOR

HIGH-FREQUENCY ACCELERATOR, METHOD FOR MANUFACTURING HIGH-FREQUENCY ACCELERATOR, QUADRUPOLE ACCELERATOR, AND METHOD FOR MANUFACTURING QUADRUPOLE ACCELERATOR

Foreign code F120006150
File No. S2010-0028-C0
Posted date Jan 12, 2012
Country WIPO
International application number 2010JP068532
International publication number WO 2011/046229
Date of international filing Oct 14, 2010
Date of international publication Apr 21, 2011
Priority data
  • P2009-238242 (Oct 15, 2009) JP
  • P2009-238292 (Oct 15, 2009) JP
Title HIGH-FREQUENCY ACCELERATOR, METHOD FOR MANUFACTURING HIGH-FREQUENCY ACCELERATOR, QUADRUPOLE ACCELERATOR, AND METHOD FOR MANUFACTURING QUADRUPOLE ACCELERATOR
Abstract A method for manufacturing a high-frequency accelerator having a cylindrical section (1) constituting an acceleration cavity includes a temporary assembling step for temporarily assembling a plurality of constituent members (11 to 14) each having a shape in which the cylindrical section (1) is parted into the shape of the cylindrical section (1) by butting the plurality of constituent members (11 to 14) against one another, and a joining step for joining the plurality of constituent members (11 to 14) to one another. The temporary assembling step includes a step for disposing supporting members (21) which are in contact with the inner surface of the cylindrical section (1) so as to support the cylindrical section (1) from the inner side in the interior of the cylindrical section (1), and the joining step includes a step for joining the plurality of constituent members (11 to 14) by means of friction stir welding along butt lines (51) of the plurality of constituent members (11 to 14).
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • Tokyo Institute of Technology
  • INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION
  • TIME CORPORATION
  • Inventor
  • HAYASHIZAKI, Noriyosu
  • HATTORI, Toshiyuki
  • ISHIBASHI, Takuya
  • NAITO, Fujio
  • TAKASAKI, Eiichi
  • YAMAUCHI, Hideaki
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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