Top > Search of International Patents > CATALYST FOR HYDROLYSIS OF CELLULOSE OR HEMICELLULOSE, AND PROCESS FOR PRODUCTION OF SUGAR-CONTAINING SOLUTION USING THE CATALYST

CATALYST FOR HYDROLYSIS OF CELLULOSE OR HEMICELLULOSE, AND PROCESS FOR PRODUCTION OF SUGAR-CONTAINING SOLUTION USING THE CATALYST

Foreign code F120006205
File No. S2009-1169
Posted date Feb 7, 2012
Country WIPO
International application number 2010JP063284
International publication number WO 2011/036955
Date of international filing Aug 5, 2010
Date of international publication Mar 31, 2011
Priority data
  • P2009-220087 (Sep 25, 2009) JP
Title CATALYST FOR HYDROLYSIS OF CELLULOSE OR HEMICELLULOSE, AND PROCESS FOR PRODUCTION OF SUGAR-CONTAINING SOLUTION USING THE CATALYST
Abstract Disclosed are: a novel catalyst for the hydrolysis of cellulose, which does not require the use of a large quantity of sulfuric acid for the preparation thereof and from which sulfuric acid cannot be eluted; a novel catalyst for the hydrolysis of cellulose, which is not changed in structure even in hot water and therefore does not undergo the deterioration in activity; and a process for producing a cellulose hydrolysate, mainly including glucose, using any one of the aforementioned catalysts. Specifically disclosed are: a catalyst for the hydrolysis of cellulose, which comprises a porous carbon material having a specific surface area of 800 to 2500 m2/g inclusive and a phenolic hydroxy group content of 100 to 700 mmol/kg inclusive, such as a porous carbon material having such a structure that carbon is filled in pores of mesoporous silica that is used as a template; and a catalyst for the hydrolysis of cellulose or hemicellulose, which comprises the aforementioned porous carbon material and a transition metal belonging to Group 8 to Group 11 and supported on the porous carbon material.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY
  • SHOWA DENKO K.K.
  • Inventor
  • FUKUOKA, Atsushi
  • KOBAYASHI, Hirokazu
  • KOMANOYA, Tasuku
  • YONEDA, Tadashi
  • FUJITA, Ichiro
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
Please contact us by E-mail or facsimile if you have any interests on this patent.

PAGE TOP

close
close
close
close
close
close