Top > Search of International Patents > ANTIBACTERIAL COMPOSITION AND ANTIVIRAL COMPOSITION EACH CONTAINING SILICON-CONTAINING COMPOUND, ANTIBACTERIALIZING METHOD, CLEANING/MOUTH CLEANING METHOD, AND METHOD FOR IMMOBILIZING ANTIBACTERIAL AGENT OR ANTIVIRAL AGENT

ANTIBACTERIAL COMPOSITION AND ANTIVIRAL COMPOSITION EACH CONTAINING SILICON-CONTAINING COMPOUND, ANTIBACTERIALIZING METHOD, CLEANING/MOUTH CLEANING METHOD, AND METHOD FOR IMMOBILIZING ANTIBACTERIAL AGENT OR ANTIVIRAL AGENT

Foreign code F120006234
File No. S2009-0227-N0
Posted date Feb 14, 2012
Country WIPO
International application number 2009JP068929
International publication number WO 2010/073825
Date of international filing Nov 5, 2009
Date of international publication Jul 1, 2010
Priority data
  • P2008-329036 (Dec 25, 2008) JP
  • P2009-205296 (Sep 4, 2009) JP
  • P2009-233013 (Oct 7, 2009) JP
Title ANTIBACTERIAL COMPOSITION AND ANTIVIRAL COMPOSITION EACH CONTAINING SILICON-CONTAINING COMPOUND, ANTIBACTERIALIZING METHOD, CLEANING/MOUTH CLEANING METHOD, AND METHOD FOR IMMOBILIZING ANTIBACTERIAL AGENT OR ANTIVIRAL AGENT
Abstract Disclosed is an antibacterial composition which is highly safe and has excellent antibacterial properties, by using a silicon-containing compound that is obtained by a specific manufacturing method. The antibacterial composition has a more stable antibacterial component, and is capable of providing teeth with antibacterial properties, while being also capable of cleaning an object or the mouth. Also disclosed are: an antiviral composition which is highly safe and has excellent virus deactivation ability; an antibacterializing method, a cleaning method and a mouth cleaning method, each using the antibacterial composition or the antiviral composition; and a method for immobilizing an antibacterial agent or an antiviral agent. The antibacterial composition is characterized by containing a silicon-containing compound which is represented by general formula (1) and obtained by reacting a specific triethoxysilyl compound in an ethanol solvent.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • HIROSHIMA UNIVERSITY
  • Inventor
  • NIKAWA, Hiroki
  • TAKEDA, Hironori
  • KAKIHARA, Toshio
  • SAKAGUCHI, Takemasa
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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