TOP > 外国特許検索 > Method for producing different populations of molecules or fine particles with arbitrary distribution forms and distribution densities simultaneously and in quantity, and masking member therefor

Method for producing different populations of molecules or fine particles with arbitrary distribution forms and distribution densities simultaneously and in quantity, and masking member therefor

外国特許コード F120006329
整理番号 AF02-04WO
掲載日 2012年3月22日
出願国 アメリカ合衆国
出願番号 99809509
公報番号 20110229953
公報番号 8808787
出願日 平成21年8月20日(2009.8.20)
公報発行日 平成23年9月22日(2011.9.22)
公報発行日 平成26年8月19日(2014.8.19)
国際出願番号 JP2009064899
国際公開番号 WO2010032595
国際出願日 平成21年8月20日(2009.8.20)
国際公開日 平成22年3月25日(2010.3.25)
優先権データ
  • 特願2008-237696 (2008.9.17) JP
  • 2009WO-JP64899 (2009.8.20) WO
発明の名称 （英語） Method for producing different populations of molecules or fine particles with arbitrary distribution forms and distribution densities simultaneously and in quantity, and masking member therefor
発明の概要（英語） (US8808787)
The formation in quantity of various different populations of a substance being studied with multiple combinations of distribution form and distribution density by dripping a suspension of a single concentration of the substance onto a masking member of a certain specified structure placed on a substrate by making use of the sedimentation of said substance.
A method to form populations of fine particles or molecules on a substrate by specifying the distribution form and distribution surface density, wherein a masking member provided with parallel through-holes and having a tilted wall structure to achieve the target distribution form and distribution density is prepared; a solution or a suspension of the substance being studied is dripped onto said masking member; and the substance settles through the region defined by the tilted wall structure of the masking member; and the result is that the substance settles along the tilted wall structure and passes through the region bounded by the upper boundary of said wall structure and deposits onto the substrate in the area bounded by the lower boundary of the wall structure.
特許請求の範囲（英語） [claim1]
1. A method for forming populations of fine particles or molecules on a substrate by specifying a distribution form and a distribution surface density, comprising: preparing a masking member comprising a tilted wall structure, wherein the tilted wall structure is designed to achieve a target distribution form and a target distribution density; positioning the masking member in close contact with a substrate; placing a solution or a suspension of the fine particles or molecules on the masking member; passing the substance through an upper region defined by an upper boundary of the tilted wall structure of the masking member; settling the substance along the tilted wall; depositing the substance onto the substrate in a predetermined area bounded by a lower boundary of the wall structure; and producing various different populations of molecules or particles with arbitrary distribution forms and distribution densities simultaneously and in quantity.
[claim2]
2. The method for producing various different populations of molecules or particles with arbitrary distribution forms and distribution densities simultaneously and in quantity as claimed in claim 1, wherein said fine particles or molecules are cells, protein, nucleic acid, bio-derived polymers, metal nanoparticles, semiconductor particles, ceramic particles, or resin particles.
[claim3]
3. The method for producing various different populations of molecules or particles with arbitrary distribution forms and distribution densities simultaneously and in quantity as claimed in claim 1, the solution or the suspension of the fine particles or molecules is free from reacting with the masking member.
[claim4]
4. The method for producing various different populations of molecules or particles with arbitrary distribution forms and distribution densities simultaneously and in quantity as claimed in claim 1, wherein said masking member comprises a groove on a surface along an upper boundary of the wall structure.
[claim5]
5. The method for producing various different populations of molecules or particles with arbitrary distribution forms and distribution densities simultaneously and in quantity as claimed in claim 1, wherein upper surfaces of said masking member comprise grooves or are tilted toward a lower opening of the through-hole and are not horizontal surfaces.
[claim6]
6. The above method for producing various different populations of molecules or particles with arbitrary distribution forms and distribution densities simultaneously and in quantity as claimed in claim 1, wherein surfaces of the wall structure are made of materials that resist adhesion of the substance.
[claim7]
7. The above method for producing various different populations of molecules or particles with arbitrary distribution forms and distribution densities simultaneously and in quantity as claimed in claim 1, wherein all or a part of the substrate on which said masking member is placed comprises porous materials, fibrous materials or gels, or a combination of any of the porous materials, the fibrous materials and the gels.
[claim8]
8. A masking member used for forming a population of molecules or fine particles on a substrate, comprising: parallel through-holes, wherein each of the through-holes comprises a tilted wall structure;
an upper opening and a lower opening, which is smaller than the upper opening, of said each of the through-holes are connected by the tilted wall structure;
an upper end of the tilted wall structure of one of the through-holes abuts on an upper end of the tilted wall structure of an adjacent one of the through-holes thereby forming a knife-edge ridge between the one of the through-holes and the adjacent one of the through-holes, wherein an upper opening area of one of the through-holes is different from an upper opening area of another one of the through-holes.
[claim9]
9. The masking member as claimed in claim 8, wherein the masking member is configured to be in contact with the substrate.
[claim10]
10. The masking member as claimed in claim 8, wherein a lower opening area of one of the through-holes is different from a lower opening area of another one of the through-holes.
[claim11]
11. The masking member as claimed in claim 8, wherein a density D of the population is defined by a formula of D=CLS/s, wherein C is a concentration of the molecules or the fine particles in a solution or a suspension, L is a depth of the solution or the suspension, S is an area of the upper opening and s is an area of the lower opening.
[claim12]
12. The masking member as claimed in claim 8, wherein the surface of the wall structure is made of a material that is resistant against adhesion of the molecules or fine particles.
[claim13]
13. The masking member as claimed in claim 8, wherein said masking member is made of silicone rubber or fluorine rubber or a combination of silicone rubber and fluorine rubber.
[claim14]
14. The above masking member as claimed in claim 8, wherein the wall structure is coated with one selected from a group consisting of polyethylene glycol, polypropylene glycol, polyvinyl alcohol, polyacrylic acid, polymethacrylic acid and polyacrylic amide or a hydrophilic polymer combining two or more selected from the group.
[claim15]
15. The masking member as claimed in claim 8, wherein said fine particles or molecules are cells, proteins, nucleic acids, bio-derived polymers, metal nanoparticles, semiconductor particles, ceramic particles, or resin particles.
[claim16]
16. The masking member as claimed in claim 8, wherein a solution or a suspension of the fine particles or molecules is free from reacting with the masking member.
[claim17]
17. The masking member as claimed in claim 8, wherein said masking member comprises a groove on a surface along an upper boundary of the wall structure of said masking member.
[claim18]
18. The masking member as claimed in claim 9, wherein all or a part of the substrate on which said masking member is placed comprises porous materials, fibrous materials or gels, or a combination of any of the porous materials, the fibrous materials and the gels.
[claim19]
19. A method for using the masking member according to claim 8 to form populations of fine particles or molecules on a substrate by specifying a distribution form and a distribution surface density, specifically, the method is for producing various different populations of molecules or particles with arbitrary distribution forms and distribution densities simultaneously and in quantity, comprising: positioning the masking member in close contact with the substrate;
placing a solution or a suspension of the fine particles or the molecules on the masking member;
passing the fine particles or molecules through the upper opening of the masking member;
settling the substance along the tilted wall; and
depositing the fine particles or molecules onto the substrate in a predetermined area bounded by a lower opening of the wall structure.
[claim20]
20. The method for forming populations of fine particles or molecules on a substrate as claimed in claim 19, wherein said fine particles or molecules are cells, proteins, nucleic acids, bio-derived polymers, metal nanoparticles, semiconductor particles, ceramic particles, or resin particles.
  • 発明者/出願人（英語）
  • IKUTA KOJI
  • IKEUCHI MASASHI
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
国際特許分類(IPC)
米国特許分類/主・副
  • C12N011/04
  • C12N011/08
参考情報 （研究プロジェクト等） CREST Novel Measuring and Analytical Technology Contributions to the Elucidation and Application of Life Phenomena AREA

日本語項目の表示

発明の名称 任意の分布形状と分布密度を有する分子または粒子の集団を同時に多種大量生成する方法とその方法に使用するマスク材
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  • E-mail: e-mail address
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  • TEL: 03-5214-8293
  • FAX: 03-5214-8476

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『 Method for producing different populations of molecules or fine particles with arbitrary distribution forms and distribution densities simultaneously and in quantity, and masking member therefor 』に関するお問合せ


  • 国立研究開発法人科学技術振興機構（ＪＳＴ） 知的財産マネジメント推進部
  • URL: http://www.jst.go.jp/chizai/
  • E-mail: e-mail address
  • Address: 〒102-8666 東京都千代田区四番町5-3
  • TEL: 03-5214-8293
  • FAX: 03-5214-8476

お問合せ

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公報 20110229953(PDF,634KB) PDF
公報 8808787(PDF,604KB) PDF
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