Top > Search of International Patents > METALLIC MATERIAL WHICH IS SOLID SOLUTION OF BODY-CENTERED CUBIC (BCC) STRUCTURE HAVING CONTROLLED CRYSTAL AXIS <001> ORIENTATION, AND PROCESS FOR PRODUCING SAME

METALLIC MATERIAL WHICH IS SOLID SOLUTION OF BODY-CENTERED CUBIC (BCC) STRUCTURE HAVING CONTROLLED CRYSTAL AXIS <001> ORIENTATION, AND PROCESS FOR PRODUCING SAME

Foreign code F120006363
Posted date Mar 27, 2012
Country WIPO
International application number 2011JP054548
International publication number WO 2011/105609
Date of international filing Feb 28, 2011
Date of international publication Sep 1, 2011
Priority data
  • P2010-042132 (Feb 26, 2010) JP
Title METALLIC MATERIAL WHICH IS SOLID SOLUTION OF BODY-CENTERED CUBIC (BCC) STRUCTURE HAVING CONTROLLED CRYSTAL AXIS <001> ORIENTATION, AND PROCESS FOR PRODUCING SAME
Abstract Provided are a metallic material, e.g., an electromagnetic material (magnetic steel sheet), that has a processed surface along which crystal axes <001> of the metallic material have been distributed by controlling the distribution of the crystal axes <001>, and a process for producing the metallic material. The metallic material, which is, for example, an electromagnetic material (magnetic steel sheet), is obtained by subjecting a metallic material comprising a solid solution of a body-centered cubic (BCC) structure to hot compression at a temperature within a range where the solid solution is constituted only of a BCC phase, thereby distributing crystal axes <001> of the metal along the processed surface of the metallic material. The process is characterized by: heating the metallic material which is, for example, an Fe-Si alloy to a temperature in a range where the alloy is a solid solution constituted only of a BCC phase; and compressing this BCC-phase solid solution at a straining rate at which the solute atom atmosphere appearing in the BCC-phase solid solution governs movements for dislocation and at which grain boundaries are kept movable using, as a power therefor, strain energy that has accumulated in the grains, thereby distributing {100} planes in parallel to the processed surface.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • National University Corporation, Yokohama National University
  • Inventor
  • FUKUTOMI Hiroshi
  • OKAYASU Kazuto
  • ONUKI Yusuke
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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