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MAGNETIC PARTICLES, PROCESS FOR PRODUCING SAME, AND MEDICINAL PREPARATION INCLUDING MAGNETIC PARTICLES

Foreign code F120006531
File No. S2010-0647-C0
Posted date May 8, 2012
Country WIPO
International application number 2011JP000638
International publication number WO 2011/096230
Date of international filing Feb 4, 2011
Date of international publication Aug 11, 2011
Priority data
  • P2010-025660 (Feb 8, 2010) JP
Title MAGNETIC PARTICLES, PROCESS FOR PRODUCING SAME, AND MEDICINAL PREPARATION INCLUDING MAGNETIC PARTICLES
Abstract Provided are magnetic particles of a novel structure and a process for producing the magnetic particles. Also provided is a medicinal preparation of a novel structure, the preparation including the magnetic particles. The magnetic-particle-including medicinal preparation (7) comprises: magnetic particles (1) that are hollow inside and comprise a magnetic cage-shaped skeleton which consists of a sintered object obtained from metallic nanoparticles including nanoparticles comprising any of Fe, Co, and Ni and in which the porosity obtained by projecting the sintered object on a two-dimensional plane, processing the projected image in terms of transmission electron microscope image, and determining the proportion of the transparent parts to the whole area inside the contour of the sintered object is 1-50%; and a coating layer (40) with which at least some of the surface layer of each magnetic particle (1) is coated. The medicinal preparation contains a drug (30) within the magnetic cage-shaped skeleton (10) and/or in the coating layer (40).
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • THE JIKEI UNIVERSITY
  • Tokyo Institute of Technology
  • TOHOKU UNIVERSITY
  • Inventor
  • NAMIKI, Yoshihisa
  • KITAMOTO, Yoshitaka
  • FUCHIGAMI, Teruaki
  • KAWAMURA, Ryo
  • NAKAGAWA, Masaru
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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