Top > Search of International Patents > CARBON MATERIAL FOR ELECTRIC DOUBLE LAYER CAPACITOR, METHOD FOR PRODUCING SAME, AND ELECTRIC DOUBLE LAYER CAPACITOR USING THE MATERIAL

CARBON MATERIAL FOR ELECTRIC DOUBLE LAYER CAPACITOR, METHOD FOR PRODUCING SAME, AND ELECTRIC DOUBLE LAYER CAPACITOR USING THE MATERIAL

Foreign code F120006617
File No. S2010-0192
Posted date May 16, 2012
Country WIPO
International application number 2010JP068580
International publication number WO 2011/142048
Date of international filing Oct 21, 2010
Date of international publication Nov 17, 2011
Priority data
  • P2010-111962 (May 14, 2010) JP
Title CARBON MATERIAL FOR ELECTRIC DOUBLE LAYER CAPACITOR, METHOD FOR PRODUCING SAME, AND ELECTRIC DOUBLE LAYER CAPACITOR USING THE MATERIAL
Abstract Disclosed are: a carbon material for an electric double layer capacitor, which is capable of providing large capacity by high-voltage charging; a method for producing the carbon material; and an electric double layer capacitor using the carbon material. Also disclosed are: a carbon material for an electric double layer capacitor, which is capable of improving the electric double layer capacity in high-voltage charging; a method for producing the carbon material; and an electric double layer capacitor using the carbon material. Specifically disclosed is a carbon material for an electric double layer capacitor, which is characterized in that: the interplanar spacing (d002) of carbon hexagonal network planes as determined by X-ray diffraction is 0.355-0.370 nm; the crystallite size (Lc) of the network planes in the lamination direction is 1-2 nm; and the electrode bulk density is 0.8-0.9 g/cm3. Also specifically disclosed is an electric double layer capacitor comprising a polarizable electrode immersed in an electrolyte solution, which is characterized in that the polarizable electrode is formed using the above-described carbon material.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY
  • Inventor
  • SHIRAISHI, Soshi
  • AJIMA, Daisuke
  • HAGIWARA, Rika
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA(CONSENSUAL PATENT),BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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