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COMPOUND HAVING SILICON-CONTAINING SUBSTITUENT INTRODUCED THERETO, AND SINGLET OXYGEN-GENERATING AGENT AND CANCER THERAPEUTIC COMPRISING SAME

Foreign code F120006618
File No. S2010-1094
Posted date May 16, 2012
Country WIPO
International application number 2011JP069070
International publication number WO 2012/029609
Date of international filing Aug 24, 2011
Date of international publication Mar 8, 2012
Priority data
  • P2010-196568 (Sep 2, 2010) JP
Title COMPOUND HAVING SILICON-CONTAINING SUBSTITUENT INTRODUCED THERETO, AND SINGLET OXYGEN-GENERATING AGENT AND CANCER THERAPEUTIC COMPRISING SAME
Abstract A compound represented by any of general formulae (I) to (IV) is to be used as the active ingredient of a singlet oxygen-generating agent. In each of R1 to R20 in general formula (I), R1 to R24 in general formula (II), R1 to R28 in general formula (III) and R1 to R16 in general formula (IV), at least one is a member selected from substituents represented by general formula (i) and (ii) [in general formulae (i) and (ii), Ra, Rb and Rc independently represent a substituent selected from among hydrogen, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, t-butyl, phenyl, methoxy, ethoxy and trimethylsilyl; and n is 1 or greater], and at least one is a substituent represented by general formula (a) [in general formula (a), Ra and Rb independently represent a substituent selected from among hydrogen, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, t-butyl, phenyl, methoxy, ethoxy and trimethylsilyl; and m is 0 or greater].
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY
  • Inventor
  • HORIUCHI, Hiroaki
  • HOSAKA, Masahiro
  • HIRATSUKA, Hiroshi
  • TAKEUCHI, Toshiyuki
  • KYUSHIN, Souichiro
  • ISHIDA, Shintaro
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA(CONSENSUAL PATENT),BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),QA,RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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