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APPARATUS AND METHOD FOR MEASURING STRAIN IN MICRO MATERIAL

Foreign code F120006622
File No. S2010-0781
Posted date May 17, 2012
Country WIPO
International application number 2011JP062565
International publication number WO 2011/152441
Date of international filing Jun 1, 2011
Date of international publication Dec 8, 2011
Priority data
  • P2010-127109 (Jun 2, 2010) JP
Title APPARATUS AND METHOD FOR MEASURING STRAIN IN MICRO MATERIAL
Abstract Disclosed is an apparatus for measuring strain in micro materials which enables the strain of a micro material to be accurately measured in a noncontact fashion when the material is subjected to tensile stress or compressive stress. The apparatus has a measuring section (150) and a strain generating section (130). The measuring section (150) includes a CCD camera (170) for sensing an interference beam of light that is formed of a measurement beam from a measured region (108) and a reference beam from a reference mirror (166D); a first objective lens (166) including the reference mirror (166D); and an image processor for measuring the three-dimensional shape of the measured region (108) from the position of the first objective lens (166) at which the interference beam of light has the maximum contrast and measuring the distance between two reference points on the basis of the three-dimensional shape. The strain generating section (130) includes a load cell (146) for measuring tensile stress and an inching X stage (140) for generating strain, wherein when strain has been generated on the micro material (102), the strain is determined for tensile stress on the basis of the measured tensile stress and the distance between the two reference points that has been changed due to the strain.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • Kumamoto University
  • SIGMA KOKI CO., LTD.
  • Inventor
  • TAKASHIMA, Kazuki
  • OTSU, Masaaki
  • MATSUDA, Mitsuhiro
  • KURAHARA, Hiroaki
  • MAEDA, Hidetaka
  • YONEKURA, Tadahiro
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA(CONSENSUAL PATENT),BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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