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POLYMER EXPANDED PARTICLE, EXPANDED TONER AND METHOD FOR PRODUCING POLYMER EXPANDED PARTICLE AND EXPANDED TONER

Foreign code F120006629
File No. S2010-0641
Posted date May 17, 2012
Country WIPO
International application number 2011JP056372
International publication number WO 2011/115203
Date of international filing Mar 17, 2011
Date of international publication Sep 22, 2011
Priority data
  • P2010-060092 (Mar 17, 2010) JP
Title POLYMER EXPANDED PARTICLE, EXPANDED TONER AND METHOD FOR PRODUCING POLYMER EXPANDED PARTICLE AND EXPANDED TONER
Abstract Disclosed are a polymer expanded particle provided with a micropore, expanded toner and a method for producing the polymer expanded particle and expanded toner. Specifically disclosed is a polymer expanded particle characterized by being provided with a micropore with an average pore diameter of less than 50 micron m. Also disclosed is an expanded toner characterized by being provided with micropores with an average pore diameter of 1 micron m to less than 3 micron m and having a volume-average particle diameter of 5 micron m to less than 15 micron m. Also disclosed is a method for producing polymer expanded particles having a first step of mixing prescribed polymer particles and a high-pressure gas or supercritical fluid to create a mixture, a second step of impregnating the polymer particles with the high-pressure gas or supercritical fluid and a third step of reducing the pressure and temperature of the mixture and obtaining polymer expanded particles. The method for producing the polymer expanded particles is characterized by the pressure and temperature being reduced from a state of 20 MPa or greater and 60 deg.C or greater to a state of less than 1 MPa and less than 30 deg.C within five minutes in the third step.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • TOMOEGAWA CO., LTD.
  • National University Corporation Shizuoka University
  • Inventor
  • SANO, Takayuki
  • KONG, Chang Yi
  • ZHANG, Tao
  • OKAJIMA, Izumi
  • SAKO, Takeshi
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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