Top > Search of International Patents > METHOD FOR PRODUCING LITHIUM ADSORBENT, LITHIUM ADSORBENT, STARTING MATERIALS FOR LITHIUM ADSORBENT, LITHIUM CONCENTRATION METHOD, AND LITHIUM CONCENTRATION DEVICE

METHOD FOR PRODUCING LITHIUM ADSORBENT, LITHIUM ADSORBENT, STARTING MATERIALS FOR LITHIUM ADSORBENT, LITHIUM CONCENTRATION METHOD, AND LITHIUM CONCENTRATION DEVICE

Foreign code F120006661
File No. S2010-0094
Posted date May 22, 2012
Country WIPO
International application number 2010JP067986
International publication number WO 2011/058841
Date of international filing Oct 13, 2010
Date of international publication May 19, 2011
Priority data
  • P2009-257552 (Nov 10, 2009) JP
Title METHOD FOR PRODUCING LITHIUM ADSORBENT, LITHIUM ADSORBENT, STARTING MATERIALS FOR LITHIUM ADSORBENT, LITHIUM CONCENTRATION METHOD, AND LITHIUM CONCENTRATION DEVICE
Abstract Provided is a method for producing a lithium adsorbent, which is used in the industrial concentration and recovery of trace amounts of lithium contained in lithium-containing water, and which has excellent selective absorbency and high adsorption speed, has a high weight/adsorption ratio, and is capable of repeated adsorption and elution. The method comprises: a mechanochemical step for mixing trimanganese tetraoxide and lithium hydroxide such that the molar ratio of manganese (x) and lithium (y) is x:y = 1:1 to 1.5:1, and subjecting the mixture to mechanochemical pulverization; a pre-calcining step for then pre-calcining in a temperature range of 375oC to 450oC in air or an oxygen atmosphere; a calcining step for then cooling, mixing, and pulverizing, followed by calcining in a temperature range of 475oC to 550oC in air or an oxygen atmosphere in order to obtain a spinel-type lithium manganate with excess oxygen; and an elution step for eluting lithium by treating the spinel-type lithium manganate with excess oxygen using an acid in an amount that is in large excess with respect to the amount of lithium.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • KITAKYUSHU FOUNDATION FOR THE ADVANCEMENT OF INDUSTRY, SCIENCE AND TECHNOLOGY
  • Inventor
  • YOSHIZUKA Kazuharu
IPC(International Patent Classification)
Specified countries AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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