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EMBEDDING RESIN COMPOSITION FOR ELECTRON MICROSCOPE, AND METHOD FOR OBSERVING SAMPLE ON ELECTRON MICROSCOPE USING SAID COMPOSITION meetings

Foreign code F130007238
Posted date Mar 28, 2013
Country WIPO
International application number 2012JP072418
International publication number WO 2013/035681
Date of international filing Sep 4, 2012
Date of international publication Mar 14, 2013
Priority data
  • P2011-193828 (Sep 6, 2011) JP
  • P2011-247267 (Nov 11, 2011) JP
  • P2011-259674 (Nov 29, 2011) JP
Title EMBEDDING RESIN COMPOSITION FOR ELECTRON MICROSCOPE, AND METHOD FOR OBSERVING SAMPLE ON ELECTRON MICROSCOPE USING SAID COMPOSITION meetings
Abstract

Provided are: an embedding resin composition for an electron microscope, which has satisfactory performance for use as an embedding agent, including embedding performance and a property of being sliced thin, and can exhibit excellent antistatic performance

and a method for observing a sample on an electron microscope using the composition. This embedding resin composition for an electron microscope comprises an ionic liquid and an embedding agent comprising an epoxy resin, a methacrylic acid resin or an unsaturated polyester resin, and has antistatic performance. It is preferred that the ionic liquid comprises a quaternary ammonium compound represented by formula (I) and an anion selected from the group consisting of BF4 -, PF6 -, (CF3SO2)2N-, a halide ion, a conjugate base of a carboxylic acid, a conjugate base of a sulfonic acid and a conjugate base of an inorganic acid.

  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • KURUME UNIVERSITY,
  • JAPAN CARLIT CO., LTD,
  • OHTA, KEISUKE,
  • KIRYU, TOSHIYUKI
  • Inventor
  • OHTA, KEISUKE,
  • KIRYU, TOSHIYUKI
IPC(International Patent Classification)
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