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METHOD FOR FORMING MAGNESIUM OXIDE THIN FILM AND PROCESSED PLATE

Foreign code F130007287
File No. K03107WO
Posted date Apr 11, 2013
Country WIPO
International application number 2012JP056191
International publication number WO 2013/035360
Date of international filing Mar 9, 2012
Date of international publication Mar 14, 2013
Priority data
  • P2011-197562 (Sep 9, 2011) JP
Title METHOD FOR FORMING MAGNESIUM OXIDE THIN FILM AND PROCESSED PLATE
Abstract

A method for depositing a magnesium oxide thin film on a substrate by a laser ablation method using a sintered body or single crystal of magnesium oxide as a target. In this method, a flat processed film, which is composed of magnesium oxide having the (111) plane as a surface, is formed by directly depositing and epitaxially growing a film on the main surface of a substrate that is composed of strontium titanate having the (111) plane as the main surface or yttria-stabilized zirconia having the (111) plane as the main surface.

  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY,
  • SUSAKI TOMOFUMI,
  • HOSONO HIDEO,
  • FUJIHASHI TADAHIRO,
  • TODA YOSHITAKE
  • Inventor
  • SUSAKI TOMOFUMI,
  • HOSONO HIDEO,
  • FUJIHASHI TADAHIRO,
  • TODA YOSHITAKE
IPC(International Patent Classification)
Reference ( R and D project ) PRESTO Materials and processes for innovative next-generation devices AREA
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