METHOD FOR FORMING MAGNESIUM OXIDE THIN FILM AND PROCESSED PLATE
|Posted date||Apr 11, 2013|
|International application number||2012JP056191|
|International publication number||WO 2013/035360|
|Date of international filing||Mar 9, 2012|
|Date of international publication||Mar 14, 2013|
|Title||METHOD FOR FORMING MAGNESIUM OXIDE THIN FILM AND PROCESSED PLATE|
A method for depositing a magnesium oxide thin film on a substrate by a laser ablation method using a sintered body or single crystal of magnesium oxide as a target. In this method, a flat processed film, which is composed of magnesium oxide having the (111) plane as a surface, is formed by directly depositing and epitaxially growing a film on the main surface of a substrate that is composed of strontium titanate having the (111) plane as the main surface or yttria-stabilized zirconia having the (111) plane as the main surface.
|IPC(International Patent Classification)||
|Reference ( R and D project )||PRESTO Materials and processes for innovative next-generation devices AREA|
Contact Information for " METHOD FOR FORMING MAGNESIUM OXIDE THIN FILM AND PROCESSED PLATE "
- Japan Science and Technology Agency Department of Intellectual Property Management
- URL: http://www.jst.go.jp/chizai/
- Address: 5-3, Yonbancho, Chiyoda-ku, Tokyo, Japan , 102-8666
- Fax: 81-3-5214-8476