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Plasma generator

Foreign code F130007395
File No. Y0364EP2
Posted date Jun 11, 2013
Country EPO
Application number 12195030
Gazette No. 2565903
Gazette No. 2565903
Date of filing Jan 15, 2004
Gazette Date Mar 6, 2013
Gazette Date Sep 10, 2014
Priority data
  • 04702413 (Jan 15, 2004) EP
  • P2003-008648 (Jan 16, 2003) JP
Title Plasma generator
Abstract A plasma generation device of the present invention, comprising: a vacuum chamber (6) for generating a plasma; at least one antenna conductor (1a) provided in the vacuum chamber (6) so as to generate an inductive electric field when high frequency power is applied; and a first insulator (12a) disposed around a portion of the antenna conductor (1a) which portion exists in the vacuum chamber (6), wherein the plasma and the antenna conductor (1a) are prevented from being in contact with each other by a first space region (18a) intervening between the first insulator (12a) and the portion; and a second insulator (12b) is disposed around the first insulator (12a) so that a second space region (18b) intervenes between the first insulator (12a) and the second insulator (12b). (see diagramm)
Scope of claims [claim1]
1. A plasma generation device, comprising: a vacuum chamber (6) for generating a plasma; at least one antenna conductor (1a) provided in the vacuum chamber (6) so as to generate an inductive electric field when high frequency power is applied; a first insulator (12a) disposed around a portion of the antenna conductor (1a) which portion exists in the vacuum chamber (6), wherein the plasma and the antenna conductor (1a) are prevented from being in contact with each other by a first space region (18a) intervening between the first insulator (12a) and the portion; characterized in that the plasma generation device comprises a second insulator (12b) disposed around the first insulator (12a) so that a second space region (18b) intervenes between the first insulator (12a) and the second insulator (12b).
[claim2]
2. The plasma generation device as set forth in claim 1, wherein: a grounding electrode surrounding the first insulator is provided on an antenna introduction section formed on the antenna conductor so as to be positioned in proximity to an internal wall of the vacuum chamber, and the second insulator is disposed around the grounding electrode so as to prevent the plasma and the grounding electrode from being in contact with each other.
[claim3]
3. The plasma generation device as set forth in claim 2, wherein the grounding electrode has a zigzag structure in which the grounding electrode alternately protrudes in a direction orthogonal to a conduction direction of the antenna conductor so that a long axis direction of the grounding electrode corresponds to the conduction direction of the antenna conductor.
[claim4]
4. The plasma generation device as set forth in claim 1, comprising a sensor provided in the vacuum chamber so as to measure an intensity of a high frequency inductive magnetic field irradiated from the antenna conductor.
[claim5]
5. The plasma generation device as set forth in claim 4, comprising a plurality of sensors provided in positions different from each other in terms of a distance from the antenna conductor.
[claim6]
6. The plasma generation device as set forth in claim 5, comprising a plasma control section for controlling a condition, under which the antenna conductor is driven, by calculating a plasma condition in the vacuum chamber on the basis of (i) a measurement result given by each of the sensors and (ii) a value of the high frequency current flowing in the antenna conductor.
[claim7]
7. The plasma generation device as set forth in claim 4, wherein the sensor includes: a magnetic field intensity detection section; and a first shield for covering the magnetic field intensity detection section.
[claim8]
8. The plasma generation device as set forth in claim 7, wherein
the sensor includes a second shield for suppressing formation of an adhering substance on the first shield and for preventing the magnetic field intensity detection section from being shielded from the high frequency inductive magnetic field.
[claim9]
9. The plasma generation device as set forth in claim 8, wherein
the second shield has a slit section for preventing the magnetic field intensity detection section from being shielded from the high frequency inductive magnetic field.
  • Applicant
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • Inventor
  • SETSUHARA YUICHI
  • SHOJI TATSUO
  • KAMAI MASAYOSHI
IPC(International Patent Classification)
Specified countries Contracting States: BE DE FR GB NL
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