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Composite material, method of producing the same, and apparatus for producing the same UPDATE

外国特許コード F150008501
整理番号 N072-17US1
掲載日 2015年11月5日
出願国 アメリカ合衆国
出願番号 201313875198
公報番号 20130323926
公報番号 9252020
出願日 平成25年5月1日(2013.5.1)
公報発行日 平成25年12月5日(2013.12.5)
公報発行日 平成28年2月2日(2016.2.2)
国際出願番号 JP2009053877
国際公開番号 WO2009110431
国際出願日 平成21年3月2日(2009.3.2)
国際公開日 平成21年9月11日(2009.9.11)
優先権データ
  • 特願2008-057865 (2008.3.7) JP
  • 特願2008-211238 (2008.8.19) JP
  • 2009WO-JP53877 (2009.3.2) WO
  • 2010US-12921348 (2010.12.9) US
発明の名称 (英語) Composite material, method of producing the same, and apparatus for producing the same UPDATE
発明の概要(英語) (US9252020)
Proposed are a composite material having a high adhesiveness, wherein non-penetrating pores that are formed in a silicone surface layer are filled up with a metal or the like without leaving any voids by using the plating technique and the silicone surface layer is coated with the metal or the like, and a method of producing the composite material.
A composite material, which has a high adhesiveness between a second metal or an alloy of the second metal (106a, 106b) and a silicone surface, can be obtained by filling up non-penetrating pores that are formed in the surface of a silicone substrate (100) substantially with a second metal or an alloy of the second metal (106a) with the use of the autocatalytic electroless plating technique wherein a first metal located at the bottom of the non-penetrating pores as described above serves as the starting point, and coating the surface of the silicone substrate (100) with the second metal (106b).
特許請求の範囲(英語) [claim1]
1. A method of producing a composite material, the method comprising: a dispersion/allocation step comprising dispersing and allocating on a silicon surface a first metal into shapes of particles, islands, or films;
a non-penetrating pore formation step comprising forming non-penetrating pores in the silicon surface by immersing the silicon surface in a second solution comprising fluoride ions, thereby forming non-penetrating pores comprising the first metal at the bottoms thereof; and
a plating step comprising substantially filling the remaining volume of the non-penetrating pores with a second metal or an alloy thereof by autocatalytic electroless plating, the plating step comprising immersing the silicon surface in a third solution comprising ions of the second metal and a reducing agent, thereby substantially filling the remaining volume of the non-penetrating pores with the second metal, or alloy thereof, and forming a film of the second metal, or alloy thereof, on portions of the silicon surface outside the pores such that the second metal or alloy thereof is adhered to the silicon surface with an adhesiveness such that the second metal, or alloy thereof, cannot be detached from the silicon surface when tested according to Japanese Industrial Standard test H8504, wherein the first metal located at bottoms of the non-penetrating pores serves as starting points for the autocatalytic electroless plating.
[claim2]
2. A method of producing a composite material, the method comprising: a dispersion/allocation step comprising dispersing and allocating on a silicon surface a first metal into shapes of particles, islands, or films by immersing the silicon surface in a first solution comprising ions of the first metal and fluoride ions;
a non-penetrating pore formation step comprising forming non-penetrating pores in the silicon surface by immersing the silicon surface in a second solution comprising fluoride ions, thereby forming non-penetrating pores comprising the first metal at the bottoms thereof; and
a plating step comprising substantially filling up the remaining volume of the non-penetrating pores with a second metal or alloy thereof by autocatalytic electroless plating, the plating step comprising immersing the silicon surface in a third solution comprising ions of the second metal and a reducing agent, thereby substantially filling the remaining volume of the non-penetrating pores with the second metal, or alloy thereof, and forming a film of the second metal, or alloy thereof, on portions of the silicon surface outside the pores such that the second metal, or alloy thereof, is adhered to the silicon surface with an adhesiveness such that the second metal or alloy thereof cannot be detached from the silicon surface when tested according to Japanese Industrial Standard test H8504, wherein the first metal located at bottoms of the non-penetrating pores serves as starting points for the autocatalytic electroless plating.
[claim3]
3. The method of claim 1, wherein the silicon surface is porous by provision of the non-penetrating pores.
[claim4]
4. The method of claim 1, wherein the first metal comprises at least one metal selected from palladium (Pd), silver (Ag), gold (Au), platinum (Pt), and rhodium (Rh).
[claim5]
5. The method of claim 1, wherein the silicon comprises at least one material selected from single-crystalline silicon, polycrystalline silicon, microcrystalline silicon, and amorphous silicon.
[claim6]
6. The method of claim 2, wherein the silicon surface is porous by provision of the non-penetrating pores.
[claim7]
7. The method of claim 2, wherein the first metal comprises at least one metal selected from palladium (Pd), silver (Ag), gold (Au), platinum (Pt), and rhodium (Rh).
[claim8]
8. The method of claim 2, wherein the silicon comprises at least one material selected from single-crystalline silicon, polycrystalline silicon, microcrystalline silicon, and amorphous silicon.
  • 発明者/出願人(英語)
  • YAE SHINJI
  • HIRANO TATSUYA
  • MATSUDA HITOSHI
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
国際特許分類(IPC)
参考情報 (研究プロジェクト等) CREST エネルギーの高度利用に向けたナノ構造材料・システムの創製 領域
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