Top > Search of International Patents > PHENACENE COMPOUND, METHOD FOR PRODUCING PHENACENE COMPOUND, AND ORGANIC LIGHT-EMITTING DIODE

PHENACENE COMPOUND, METHOD FOR PRODUCING PHENACENE COMPOUND, AND ORGANIC LIGHT-EMITTING DIODE meetings

Foreign code F170009091
File No. (S2016-0048-N0)
Posted date May 30, 2017
Country WIPO
International application number 2016JP080392
International publication number WO 2017065219
Date of international filing Oct 13, 2016
Date of international publication Apr 20, 2017
Priority data
  • P2015-205045 (Oct 16, 2015) JP
Title PHENACENE COMPOUND, METHOD FOR PRODUCING PHENACENE COMPOUND, AND ORGANIC LIGHT-EMITTING DIODE meetings
Abstract A phenacene compound represented by general formula (1). In general formula (1), R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 each independently represent a hydrogen atom or a group represented by general formula (2), and any one of R3, R5, and R6 is a group represented by general formula (2). R9 and R10, together with the carbon atoms to which R9 and R10 are bonded, may bond to each other to form a condensed ring. In general formula (2), * indicates the bonding position with a compound represented by general formula (1). X indicates a halogen group, and Y1 represents an aryl group or heteroaryl group.
Scope of claims [claim1]
1. The below-mentioned general formula the [huenasen] chemical compound which is displayed with (1).
(General system (1) in, R (1), R (2), R (3), R (4), R (5), R (6), R (7), R (8), R (9) and R (10), in the respective independence, the hydrogen atom or it is displayed with the below-mentioned general formula is the basis which (2) the basis where is displayed, R (3), R (5) and R each (6) one is displayed with the below-mentioned general formula (2).
R (9) with R (10) with, R (9) and R (10) with the carbon atom which is connected, connecting mutually, it is possible to form reduction ring.)
(General system (2) in, * the aforementioned general system connection position of the chemical compound which is displayed with (1) is shown.
X shows the halogen basis, Y (1) displays the aryl basis or the hetero aryl basis.)
[claim2]
2. The aforementioned general system (1) in, R (5) the aforementioned general system in the claim 1 which is the basis which is displayed with (2) the [huenasen] chemical compound of statement.
[claim3]
3. The below-mentioned general formula about the protective chemical engineering which the protective conversion medicine depending, protects the carbonyl group of the chemical compound which is displayed with (3) and,
The chemical compound which can by about the aforementioned protective chemical engineering, with the optical reduction ring reaction reduction ring the optical reduction ring process which forms the benzene ring which is done and,
By protecting the chemical compound which can by the aforementioned optical reduction ring process, with the deviation from protective conversion medicine deviation from the below-mentioned general formula about the deviation from protective chemical engineering which synthesizes the [huenasen] chemical compound which is displayed with (4) and,
Production method of the [huenasen] chemical compound which is included.
(General system (3) in, R (11), R (12), R (13), R (14), R (15), R (16), R (17), R (18), R (19), R (20), R (21), and R (22), in the respective independence, the hydrogen atom, to display the alkyl group of carbon count 6 or less or the acyl basis of the carbon count 1-12, R (11), R (12), R (13), R (14), R (15), R (16), R(17) R (18), R (19), R (20), R (21), and R (22) one displays the acyl basis of the carbon count 1-12 at least.
R (21) with R (22) with, R (21) and R (22) with the carbon atom which is connected, connecting mutually, it is possible to form reduction ring.)
(General system (4) in, R (23), R (24), R (25), R (26), R (27), R (28), R (29), R (30), R (31) and R (32), in the respective independence, the hydrogen atom, to display the alkyl group of carbon count 6 or less or the acyl basis of the carbon count 1-12, R (23), R (24), R (25), R (26), R (27), R (28), R (29), R (30), R (31) And R (32) one displays the acyl basis of the carbon count 1-12 at least.
R (31) with R (32) with, R (31) and R (32) with the carbon atom which is connected, connecting mutually, it is possible to form reduction ring.)
[claim4]
4. As for the aforementioned protective conversion medicine, in the claim 3 which is the diol compound production method of the [huenasen] chemical compound of statement.
[claim5]
5. As for the aforementioned deviation from protective conversion medicine, in each case is chosen from *** water chloral and the Pell oxy one potassium sulfate the claim 3 which is one or in claim 4 production method of the [huenasen] chemical compound of statement.
[claim6]
6. Furthermore, by reacting with chemical compound and the carbonyl group content chemical compound which can by about the aforementioned deviation from protective chemical engineering the below-mentioned general formula either of the claim 3- claim 5 which includes the ***.beta.-jiketon derivative synthetic process which synthesizes the ***.beta.-jiketon derivative which is displayed with (5) in one section production method of the [huenasen] chemical compound of statement.
(General system (5) in, R (33), R (34), R (35), R (36), R (37), R (38), R (39), R (40), R (41) and R (42), in the respective independence, the hydrogen atom, the alkyl group or is displayed with the below-mentioned general formula of carbon count 6 or less (6) to be the basis which, R (33), R (34), R (35), R (36), R (37), R (38), R (39), R (40),R (41) and R (42) the basis where one is displayed at least with the below-mentioned general formula (6) is displayed.
R (41) with R (42) with, R (41) and R (42) with the carbon atom which is connected, connecting mutually, it is possible to form reduction ring.)
(General system (6) in, * the aforementioned general system connection position of the chemical compound which is displayed with (5) is shown.
Y (1) displays the aryl basis or the hetero aryl basis.)
[claim7]
7. Furthermore, by reacting with chemical compound and the halogenation boron which can by the aforementioned ***.beta.-jiketon derivative synthetic process, the below-mentioned general formula (7) with in the claim 6 which includes the complex formation process which forms the complex which is displayed production method of the [huenasen] chemical compound of statement.
(General system (7) in, R (43), R (44), R (45), R (46), R (47), R (48), R (49), R (50), R (51) and R (52), in the respective independence, the hydrogen atom, the alkyl group or is displayed with the below-mentioned general formula of carbon count 6 or less (2) to be the basis which, R (43), R (44), R (45), R (46), R (47), R (48), R (49), R (50) R (51) and R (52) the basis where one is displayed at least with the below-mentioned general formula (2) is displayed.
R (51) with R (52) with, R (51) and R (52) with the carbon atom which is connected, connecting mutually, it is possible to form reduction ring.)
(General system (2) in, * the aforementioned general system (7) with connection position of the chemical compound which is displayed is shown.
X shows the halogen basis, Y (1) displays the aryl basis or the hetero aryl basis.)
[claim8]
8. The below-mentioned general formula (8) with the [huenasen] chemical compound which is displayed.
(General system (8) in, Y (2) displays phenyl group, the frill basis or the [chieniru] basis.
Z (1) shows the fact that it is the benzene ring 0 or more reduction ring it does.)
[claim9]
9. The below-mentioned formula (1-1) with the [huenasen] chemical compound which is displayed.
[claim10]
10. Claim 1 or the organic luminous element which includes the [huenasen] chemical compound of statement in claim 2.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • GUNMA UNIVERSITY
  • Inventor
  • YAMAJI MINORU
IPC(International Patent Classification)
Specified countries (WO201765219)
National States: AE AG AL AM AO AT AU AZ BA BB BG BH BN BR BW BY BZ CA CH CL CN CO CR CU CZ DE DJ DK DM DO DZ EC EE EG ES FI GB GD GE GH GM GT HN HR HU ID IL IN IR IS JP KE KG KN KP KR KW KZ LA LC LK LR LS LU LY MA MD ME MG MK MN MW MX MY MZ NA NG NI NO NZ OM PA PE PG PH PL PT QA RO RS RU RW SA SC SD SE SG SK SL SM ST SV SY TH TJ TM TN TR TT TZ UA UG US UZ VC VN ZA ZM ZW
ARIPO: BW GH GM KE LR LS MW MZ NA RW SD SL SZ TZ UG ZM ZW
EAPO: AM AZ BY KG KZ RU TJ TM
EPO: AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
OAPI: BF BJ CF CG CI CM GA GN GQ GW KM ML MR NE SN ST TD TG
Please contact us by E-mail or facsimile if you have any interests on this patent.

PAGE TOP

close
close
close
close
close
close