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ELLIPSOMETRY DEVICE AND ELLIPSOMETRY METHOD UPDATE 新技術説明会

外国特許コード F180009379
整理番号 (S2016-1083-N0)
掲載日 2018年4月19日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2017JP029829
国際公開番号 WO 2018038064
国際出願日 平成29年8月21日(2017.8.21)
国際公開日 平成30年3月1日(2018.3.1)
優先権データ
  • 特願2016-163989 (2016.8.24) JP
発明の名称 (英語) ELLIPSOMETRY DEVICE AND ELLIPSOMETRY METHOD UPDATE 新技術説明会
発明の概要(英語) The present invention provides an ellipsometry device and method whereby measurement efficiency can be enhanced. In this method, an object is illuminated by spherical-wave illumination light Q linearly polarized at 45° (S1), and object light O as reflected light is acquired in a hologram IOR using a spherical-wave reference light R having a focal point near the focal point of the illumination light Q, and a hologram ILR of the reference light R is furthermore acquired using spherical-wave reference light L having the same focal point as the illumination light Q (S2). The holograms are separated into p- and s-polarized light holograms IκOR, IκLR (κ = p, s) and processes, object light waves are extracted, and an object light spatial frequency spectrum Gκ(u, v) (κ = p, s) is generated (S3) (S4). An ellipsometry angle Ψ(θ), Δ(θ) is obtained for each incidence angle θ from the amplitude reflection coefficient ratio ρ = Gp/Gs = tanΨ∙exp(iΔ). Through use of numerous lights having different incidence angles θ included by the illumination light Q, data of numerous reflection lights can be acquired at once in a hologram and processed.
従来技術、競合技術の概要(英語) BACKGROUND ART
Conventionally, the optical properties of the material, the dielectric characteristics were examined as a technique more general ellipsometry (ellipsometric technique) has been known. Ellipsometry is, when the incident light is reflected from the material measuring a change in the polarization state of light. From a change in the polarization state of light, the dielectric characteristics of the material can be found. Changes the state of polarization, p-polarized light and s-polarized light of the reflection coefficient amplitude rp, rs is measured as a ratio. Amplitude reflection coefficient rp, rs is a complex number a, the reflection amplitude ratio and the coefficient ratio ρ=rp /rs complex and also, one of the ellipsometry angle Ψ 2, Δ ρ=tan (Ψ) exp (i Δ) and by being represented,. Ψ angle ellipsometry obtained as a measurement result, Δ is, the optical characteristics of individual substances depends on the thickness of the reflective film and the like. Ellipsometry and ellipsometry method is used ellipsometry device, handling a thin film of a film thickness of the wavelength of light such as in the semiconductor field, and the characteristics of the thin film is used for measuring the film thickness.
For the thin film measuring ellipsometry device, referred to as an ellipsometer. Is an ellipsometer, the light reflected from the thin film measuring the change of the polarization state in the optical constant of the thin film, film thickness, etc. used to determine the layer structure. Is a conventional ellipsometer, a mechanical polarizer is rotated-type device, using the elasticity of the polarization-modulated light of the largely divided into a device. To the rotation of the polarizer, the analyzer (polarizer) is the rotation of the rotation of the compensator. The setting of the polarization state of incident light, the polarization state by the detection of the reflected light, the reflected light from the incident light to the polarization state of light upon a change of the measured change.
Is measured, under different conditions, or, under the optimal conditions for measuring, mechanically rotating the polarizer, the photoelastic modulator for modulating light transmission of light with or, to measure changes in strength of the reflected light can be performed. For detecting the setting of the polarization state of the mechanical rotation of the polarizer and the operation of the phase modulation of light, longer measurement time. Therefore, the rotation of the polarizer is eliminated to speed up the drive unit has been proposed is an ellipsometer (for example, see Patent Document 1).
In addition to the amplitude reflection coefficient ρ ratio, by using information of the wavelength to increase the accuracy of the thin film. In this case, the film thickness of the single layer film or multilayer film as well as measurement of the optical constants can be structural analysis. The wavelength information is used in an ellipsometer, a spectroscopic ellipsometer is. Is a spectroscopic ellipsometer, spectral analysis techniques (ellipsometry) polarization (spectroscopy) analysis techniques to be used in combination. Is measured, the rotating polarizer and the rotation compensator such as a photoelastic modulator or in addition to the polarization of the light equipment, high-performance spectroscope is required, increases the cost of the device.
In addition, to techniques for analyzing light such as reflected light, light intensity and phase of the light waves are referred to as a combination of the data of the hologram recorded in a recording medium such as a photographic plate and the holography analysis. Is holographic in recent years, semiconductor memory or the like and the imaging device, the light intensity and phase of the wave and is recorded as digital data, or computer generated hologram, the analysis is being performed. In this way is the holography, referred to as digital holography.
In the digital holography, the hologram recording and high speed processing and high accuracy in order to achieve a variety of techniques have been proposed. For example, the complex amplitude in-line hologram is recorded at high speed and accurately analyze, a hologram recorded by the spatial frequency filtering is applied to the spatial heterodyne modulation one-shot digital holography has been proposed (for example, see Patent Document 2). The conventional optical microscope in order to solve the problem, the imaging lens without the use of a large numerical aperture of the object light of the one-shot method of recording, recording is carried out of the plane wave development object 3 to a high-resolution three-dimensional image accurately playing computer, and a distortion-free high-resolution 3 - dimensional moving images can be reproduced with a three-dimensional microscope 3 utilizes a lens has been proposed (for example, see Patent Document 3).
In addition, the internal structure of the biological tissue and cells in culture in order to measure a high resolution, and a wavelength swept laser light reflection type microscope lens-less holographic high-resolution tomographic imaging method is used has been proposed (for example, see Patent Document 4). Further, different incident angle of the recording light is irradiated a plurality of large numerical aperture more than 1 numerical aperture of the light from the object a method for synthesizing the object light, and ultra-high resolution having a resolution that exceeds the diffraction limit of the three-dimensional microscope 3 has been proposed (for example, see Patent Document 5).
Also, in conjunction with digital holography, and a beam resulting from transmission of a measurement sample, and interference between the transmission of the beam is received by the CCD, this interference can be measured by Fourier transform of the image to determine the optical constants of the sample, the method according to the dispersion Fourier transform spectrometry (DFTS) is known (for example, see Non-Patent Document 1). Similarly, and the beam transmitted through the measurement sample, the beam does not transmit an interference image of the Fourier transform is calculated and the optical path length calculated in the thickness, the thickness of the thin film interferometry has been known a method of measuring (for example, see Non-Patent Document 2). Further, a hologram is used to generate the parallel light is irradiated on a sample for measurement, a measurement sample is divided into light that has passed through, and then change the phase of the interference, and to measure changes in strength of the interference fringes to calculate a film thickness, interference contrast method has been known a method of measuring the film thickness (for example, see Patent Document 6).
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • UNIVERSITY OF HYOGO
  • 発明者(英語)
  • SATO, Kunihiro
国際特許分類(IPC)
指定国 National States: AE AG AL AM AO AT AU AZ BA BB BG BH BN BR BW BY BZ CA CH CL CN CO CR CU CZ DE DJ DK DM DO DZ EC EE EG ES FI GB GD GE GH GM GT HN HR HU ID IL IN IR IS JO JP KE KG KH KN KP KR KW KZ LA LC LK LR LS LU LY MA MD ME MG MK MN MW MX MY MZ NA NG NI NO NZ OM PA PE PG PH PL PT QA RO RS RU RW SA SC SD SE SG SK SL SM ST SV SY TH TJ TM TN TR TT TZ UA UG US UZ VC VN ZA ZM ZW
ARIPO: BW GH GM KE LR LS MW MZ NA RW SD SL SZ TZ UG ZM ZW
EAPO: AM AZ BY KG KZ RU TJ TM
EPO: AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
OAPI: BF BJ CF CG CI CM GA GN GQ GW KM ML MR NE SN ST TD TG

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